{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/84478"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/84478","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"Kinetic and Mechanistic Studies of Chemical Vapor Deposition Processes on Metal Surfaces","abstract":"Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","abstract_html":"Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","abstract_has_math":false,"creators":["Crane, Elizabeth Larson"],"institution":"University of Illinois at Urbana-Champaign","degree_name":"Ph.D.","degree_level":"Dissertation","degree_discipline":"Chemistry","degree_department":null,"school":null,"contributors":["Nuzzo, Ralph G."],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2015,"date_issued":"2015-09-25T22:14:44Z","date_published":"2015-09-25T22:14:44Z","updated_at":"2026-07-22T22:26:23Z","subjects":["Chemistry, Inorganic"],"languages":["eng"],"rights":[],"rights_urls":[],"identifier_entries":[{"key":"dc:identifier","label":"Identifier","values":["(MiAaPQ)AAI9989972"],"render_values":[{"text":"(MiAaPQ)AAI9989972","href":null,"code":true}]}]},"links":{"outbound_url":"http://hdl.handle.net/2142/84478","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Nuzzo, Ralph G."]},{"key":"dc:creator","label":"Author","values":["Crane, Elizabeth Larson"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2015-09-25T22:14:44Z","10000-01-01","2000"]},{"key":"dc:type","label":"Dc Type","values":["text"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Chemistry"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Dissertation"]},{"key":"thesis:degree_name","label":"Degree Name","values":["Ph.D."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Chemistry, Inorganic"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["eng"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["http://hdl.handle.net/2142/84478","(MiAaPQ)AAI9989972"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","U of I Only","Metal deposition from hexafluoroacetylacetonate complexes is also examined on Cu(111) and Pt(100) surfaces single crystal surfaces. In the case of the Rh(hfac)(C2H4)2 and Pt(hfac)2 on a copper surface, the transfer of the hfac ligands takes place below ∼220 K and this species subsequently either decomposes or reacts with the substrate to form Cu(hfac)2. This latter reaction is promoted by the presence of platinum on the copper surface but not by the presence of rhodium. In the reaction of Pt(hfac)2 on Pt(100), ligand dissociation begins ∼400 K and the resultant CFx surface fragments recombine to form a fluorocarbon species. This pathway is more strongly promoted in the presence of hydrogen as a reducing agent.","Made available in DSpace on 2015-09-25T22:14:44Z (GMT). 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In the case of the Rh(hfac)(C2H4)2 and Pt(hfac)2 on a copper surface, the transfer of the hfac ligands takes place below ∼220 K and this species subsequently either decomposes or reacts with the substrate to form Cu(hfac)2. This latter reaction is promoted by the presence of platinum on the copper surface but not by the presence of rhodium. In the reaction of Pt(hfac)2 on Pt(100), ligand dissociation begins ∼400 K and the resultant CFx surface fragments recombine to form a fluorocarbon species. This pathway is more strongly promoted in the presence of hydrogen as a reducing agent.","Made available in DSpace on 2015-09-25T22:14:44Z (GMT). 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