{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/84462"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/84462","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"Studies of Structure and Reactivity in Monolayer Assemblies: 1. Ozonolysis of Alkanethiolate Self Assembled Monolayers on Au. 2. In-Plane Resistivity of Ultrathin Gold Films as a High Sensitivity, Molecularly Differentiated Probe of Chemisorption at the Liquid-Metal Interface","abstract":"Ultrathin gold films, with thicknesses between the onset of conductivity (d ∼ 5 nm) and the electron mean free path ( d ∼ 80 nm), display surface-sensitive resistivities, which have been exploited to follow the adsorption and desorption of molecular monolayers at the metal solution interface with high precision. For nominal Au film thicknesses (d ∼ 40 nm), strongly chemisorbed thiolate monolayers increase the resistivity of the thin Au films by ca. 4%, but weakly adsorbed species, such as pyridine or phenolate at open circuit, induce no observable change in the Au film resistance. Resistivity measurements implemented with a high stability current source and high-precision digital voltmeter sampling at 1 Hz resulted in 3 sigma uncertainties in alkanethiolate coverage of 1.4 x 10--4 monolayer. Correlating chemical manipulations with changes in surface morphology as characterized by AFM indicates a significant morphology-related contribution to resistivity which must be controlled to extract meaningful information related to the electronic interaction of adsorbate and substrate.","abstract_html":"Ultrathin gold films, with thicknesses between the onset of conductivity (d ∼ 5 nm) and the electron mean free path ( d ∼ 80 nm), display surface-sensitive resistivities, which have been exploited to follow the adsorption and desorption of molecular monolayers at the metal solution interface with high precision. For nominal Au film thicknesses (d ∼ 40 nm), strongly chemisorbed thiolate monolayers increase the resistivity of the thin Au films by ca. 4%, but weakly adsorbed species, such as pyridine or phenolate at open circuit, induce no observable change in the Au film resistance. Resistivity measurements implemented with a high stability current source and high-precision digital voltmeter sampling at 1 Hz resulted in 3 sigma uncertainties in alkanethiolate coverage of 1.4 x 10--4 monolayer. Correlating chemical manipulations with changes in surface morphology as characterized by AFM indicates a significant morphology-related contribution to resistivity which must be controlled to extract meaningful information related to the electronic interaction of adsorbate and substrate.","abstract_has_math":false,"creators":["Zhang, Yumo"],"institution":"University of Illinois at Urbana-Champaign","degree_name":"Ph.D.","degree_level":"Dissertation","degree_discipline":"Chemistry","degree_department":null,"school":null,"contributors":["Bohn, Paul W."],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2015,"date_issued":"2015-09-25T22:14:37Z","date_published":"2015-09-25T22:14:37Z","updated_at":"2026-07-22T22:26:23Z","subjects":["Chemistry, Analytical"],"languages":["eng"],"rights":[],"rights_urls":[],"identifier_entries":[{"key":"dc:identifier","label":"Identifier","values":["(MiAaPQ)AAI9953187"],"render_values":[{"text":"(MiAaPQ)AAI9953187","href":null,"code":true}]}]},"links":{"outbound_url":"http://hdl.handle.net/2142/84462","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Bohn, Paul W."]},{"key":"dc:creator","label":"Author","values":["Zhang, Yumo"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2015-09-25T22:14:37Z","10000-01-01","1999"]},{"key":"dc:type","label":"Dc Type","values":["text"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Chemistry"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Dissertation"]},{"key":"thesis:degree_name","label":"Degree Name","values":["Ph.D."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Chemistry, Analytical"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["eng"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["http://hdl.handle.net/2142/84462","(MiAaPQ)AAI9953187"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["Ultrathin gold films, with thicknesses between the onset of conductivity (d ∼ 5 nm) and the electron mean free path ( d ∼ 80 nm), display surface-sensitive resistivities, which have been exploited to follow the adsorption and desorption of molecular monolayers at the metal solution interface with high precision. For nominal Au film thicknesses (d ∼ 40 nm), strongly chemisorbed thiolate monolayers increase the resistivity of the thin Au films by ca. 4%, but weakly adsorbed species, such as pyridine or phenolate at open circuit, induce no observable change in the Au film resistance. Resistivity measurements implemented with a high stability current source and high-precision digital voltmeter sampling at 1 Hz resulted in 3 sigma uncertainties in alkanethiolate coverage of 1.4 x 10--4 monolayer. Correlating chemical manipulations with changes in surface morphology as characterized by AFM indicates a significant morphology-related contribution to resistivity which must be controlled to extract meaningful information related to the electronic interaction of adsorbate and substrate.","Made available in DSpace on 2015-09-25T22:14:37Z (GMT). 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In-Plane Resistivity of Ultrathin Gold Films as a High Sensitivity, Molecularly Differentiated Probe of Chemisorption at the Liquid-Metal Interface"]}]}],"canonical_facts":{"dc:contributor":["Bohn, Paul W."],"dc:creator":["Zhang, Yumo"],"dc:date":["2015-09-25T22:14:37Z","10000-01-01","1999"],"dc:description":["Ultrathin gold films, with thicknesses between the onset of conductivity (d ∼ 5 nm) and the electron mean free path ( d ∼ 80 nm), display surface-sensitive resistivities, which have been exploited to follow the adsorption and desorption of molecular monolayers at the metal solution interface with high precision. For nominal Au film thicknesses (d ∼ 40 nm), strongly chemisorbed thiolate monolayers increase the resistivity of the thin Au films by ca. 4%, but weakly adsorbed species, such as pyridine or phenolate at open circuit, induce no observable change in the Au film resistance. Resistivity measurements implemented with a high stability current source and high-precision digital voltmeter sampling at 1 Hz resulted in 3 sigma uncertainties in alkanethiolate coverage of 1.4 x 10--4 monolayer. Correlating chemical manipulations with changes in surface morphology as characterized by AFM indicates a significant morphology-related contribution to resistivity which must be controlled to extract meaningful information related to the electronic interaction of adsorbate and substrate.","Made available in DSpace on 2015-09-25T22:14:37Z (GMT). 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In-Plane Resistivity of Ultrathin Gold Films as a High Sensitivity, Molecularly Differentiated Probe of Chemisorption at the Liquid-Metal Interface"],"dc:type":["text"],"thesis:degree_discipline":["Chemistry"],"thesis:degree_level":["Dissertation"],"thesis:degree_name":["Ph.D."],"thesis:institution_name":["University of Illinois at Urbana-Champaign"]},"updated_at":"2026-07-22T22:26:23Z"}