{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/82894"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/82894","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"Study of Charged Liquid Cluster Beam Generation and Application to Processing of Thin Films and Nanoparticles","abstract":"The CLCB spraying was applied to processing of thin films and nanoparticles. Silica nanospheres were fabricated using the CLCB technique. The median size of the resulting silica nanospheres was around 10 nm and the smallest size observed within the SEM resolution limit was 5 nm. Quantum wires of GaAs and silicon nanotips were fabricated by combining CLCB deposition of silica nanospheres and reactive ion etching. The median size of the quantum wires is 50 nm. Photoluminescence (PL) measurements indicated a blue shift of 4.5 nm corresponding to an 8-meV energy shift was observed due to quantum size effect. The CLCB technique was applied to the fabrication of ZnO thin films on silicon substrates with a thin layer of native oxide. The films were very uniform, densely packed, and c-axis-oriented polycrystalline. The electrical resistivities of the annealed films ranged from $7.99 \\times 10\\sp{-3}$ to $1.60 \\times 10\\sp{-2}\\ \\Omega$-cm. The electron carrier concentrations were in the range of 3.33-5.35 $\\times\\ 10 \\sp{19}$ cm$\\sp{-3}$ and the mobilities were 7.30-19.07 cm$\\sp2$V$\\sp{-1}$s$\\sp{-1}.$ Optically active, highly concentrated Er$\\sp{3+}$-$\\rm Al\\sp{3+}$ co-doped silica thin films were fabricated on fused silica substrates by sol-gel method. Photoluminescence (PL) measurements indicated that Er ions were optically active in all films of different Er concentrations. A broad-band peak was observed at 1531 nm with the full-width at half-maximum (FWHM) of 42 nm due to the $\\sp4$I$\\rm\\sb{13/2} \\to \\sp4$I$\\sb{15/2}.$ transition. The PL peak showed maximum intensity at an Er concentration of 8535 ppm. This implies the concentration quenching at higher Er$\\sp{3+}$ concentrations.","abstract_html":"The CLCB spraying was applied to processing of thin films and nanoparticles. Silica nanospheres were fabricated using the CLCB technique. The median size of the resulting silica nanospheres was around 10 nm and the smallest size observed within the SEM resolution limit was 5 nm. Quantum wires of GaAs and silicon nanotips were fabricated by combining CLCB deposition of silica nanospheres and reactive ion etching. The median size of the quantum wires is 50 nm. Photoluminescence (PL) measurements indicated a blue shift of 4.5 nm corresponding to an 8-meV energy shift was observed due to quantum size effect. The CLCB technique was applied to the fabrication of ZnO thin films on silicon substrates with a thin layer of native oxide. The films were very uniform, densely packed, and c-axis-oriented polycrystalline. The electrical resistivities of the annealed films ranged from $7.99 \\times 10\\sp{-3}$ to <span class=\"etd-inline-math\">1.60 \\times 10\\sp{-2} \\Omega</span>-cm. The electron carrier concentrations were in the range of 3.33-5.35 <span class=\"etd-inline-math\">\\times 10 \\sp{19}</span> cm$\\sp{-3}$ and the mobilities were 7.30-19.07 cm$\\sp2$V$\\sp{-1}$s$\\sp{-1}.$ Optically active, highly concentrated Er$\\sp{3+}$-$\\rm Al\\sp{3+}$ co-doped silica thin films were fabricated on fused silica substrates by sol-gel method. Photoluminescence (PL) measurements indicated that Er ions were optically active in all films of different Er concentrations. A broad-band peak was observed at 1531 nm with the full-width at half-maximum (FWHM) of 42 nm due to the $\\sp4$I$\\rm\\sb{13/2} \\to \\sp4$I$\\sb{15/2}.$ transition. The PL peak showed maximum intensity at an Er concentration of 8535 ppm. This implies the concentration quenching at higher Er$\\sp{3+}$ concentrations.","abstract_has_math":true,"creators":["Ryu, Choon Kun"],"institution":"University of Illinois at Urbana-Champaign","degree_name":"Ph.D.","degree_level":"Dissertation","degree_discipline":"Materials Science and Engineering","degree_department":null,"school":null,"contributors":["Kim, Kyekyoon"],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2015,"date_issued":"2015-09-25T20:53:30Z","date_published":"2015-09-25T20:53:30Z","updated_at":"2026-07-22T22:26:20Z","subjects":["Engineering, Materials Science"],"languages":["eng"],"rights":[],"rights_urls":[],"identifier_entries":[{"key":"dc:identifier","label":"Identifier","values":["(MiAaPQ)AAI9812759"],"render_values":[{"text":"(MiAaPQ)AAI9812759","href":null,"code":true}]}]},"links":{"outbound_url":"http://hdl.handle.net/2142/82894","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Kim, Kyekyoon"]},{"key":"dc:creator","label":"Author","values":["Ryu, Choon Kun"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2015-09-25T20:53:30Z","10000-01-01","1997"]},{"key":"dc:type","label":"Dc Type","values":["text"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Materials Science and Engineering"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Dissertation"]},{"key":"thesis:degree_name","label":"Degree Name","values":["Ph.D."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Engineering, Materials Science"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["eng"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["http://hdl.handle.net/2142/82894","(MiAaPQ)AAI9812759"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["The CLCB spraying was applied to processing of thin films and nanoparticles. Silica nanospheres were fabricated using the CLCB technique. The median size of the resulting silica nanospheres was around 10 nm and the smallest size observed within the SEM resolution limit was 5 nm. Quantum wires of GaAs and silicon nanotips were fabricated by combining CLCB deposition of silica nanospheres and reactive ion etching. The median size of the quantum wires is 50 nm. Photoluminescence (PL) measurements indicated a blue shift of 4.5 nm corresponding to an 8-meV energy shift was observed due to quantum size effect. The CLCB technique was applied to the fabrication of ZnO thin films on silicon substrates with a thin layer of native oxide. The films were very uniform, densely packed, and c-axis-oriented polycrystalline. The electrical resistivities of the annealed films ranged from $7.99 \\times 10\\sp{-3}$ to $1.60 \\times 10\\sp{-2}\\ \\Omega$-cm. The electron carrier concentrations were in the range of 3.33-5.35 $\\times\\ 10 \\sp{19}$ cm$\\sp{-3}$ and the mobilities were 7.30-19.07 cm$\\sp2$V$\\sp{-1}$s$\\sp{-1}.$ Optically active, highly concentrated Er$\\sp{3+}$-$\\rm Al\\sp{3+}$ co-doped silica thin films were fabricated on fused silica substrates by sol-gel method. Photoluminescence (PL) measurements indicated that Er ions were optically active in all films of different Er concentrations. A broad-band peak was observed at 1531 nm with the full-width at half-maximum (FWHM) of 42 nm due to the $\\sp4$I$\\rm\\sb{13/2} \\to \\sp4$I$\\sb{15/2}.$ transition. The PL peak showed maximum intensity at an Er concentration of 8535 ppm. This implies the concentration quenching at higher Er$\\sp{3+}$ concentrations.","Made available in DSpace on 2015-09-25T20:53:30Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 9812759.pdf: 4010143 bytes, checksum: 8f0598c283265dc7e760b07a79964661 (MD5) Previous issue date: 1997","Embargo set by: Seth Robbins for item 84175 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","U of I Only","122 p.","Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1997."]},{"key":"dc:title","label":"Title","values":["Study of Charged Liquid Cluster Beam Generation and Application to Processing of Thin Films and Nanoparticles"]}]}],"canonical_facts":{"dc:contributor":["Kim, Kyekyoon"],"dc:creator":["Ryu, Choon Kun"],"dc:date":["2015-09-25T20:53:30Z","10000-01-01","1997"],"dc:description":["The CLCB spraying was applied to processing of thin films and nanoparticles. Silica nanospheres were fabricated using the CLCB technique. The median size of the resulting silica nanospheres was around 10 nm and the smallest size observed within the SEM resolution limit was 5 nm. Quantum wires of GaAs and silicon nanotips were fabricated by combining CLCB deposition of silica nanospheres and reactive ion etching. The median size of the quantum wires is 50 nm. Photoluminescence (PL) measurements indicated a blue shift of 4.5 nm corresponding to an 8-meV energy shift was observed due to quantum size effect. The CLCB technique was applied to the fabrication of ZnO thin films on silicon substrates with a thin layer of native oxide. The films were very uniform, densely packed, and c-axis-oriented polycrystalline. The electrical resistivities of the annealed films ranged from $7.99 \\times 10\\sp{-3}$ to $1.60 \\times 10\\sp{-2}\\ \\Omega$-cm. The electron carrier concentrations were in the range of 3.33-5.35 $\\times\\ 10 \\sp{19}$ cm$\\sp{-3}$ and the mobilities were 7.30-19.07 cm$\\sp2$V$\\sp{-1}$s$\\sp{-1}.$ Optically active, highly concentrated Er$\\sp{3+}$-$\\rm Al\\sp{3+}$ co-doped silica thin films were fabricated on fused silica substrates by sol-gel method. Photoluminescence (PL) measurements indicated that Er ions were optically active in all films of different Er concentrations. A broad-band peak was observed at 1531 nm with the full-width at half-maximum (FWHM) of 42 nm due to the $\\sp4$I$\\rm\\sb{13/2} \\to \\sp4$I$\\sb{15/2}.$ transition. The PL peak showed maximum intensity at an Er concentration of 8535 ppm. This implies the concentration quenching at higher Er$\\sp{3+}$ concentrations.","Made available in DSpace on 2015-09-25T20:53:30Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 9812759.pdf: 4010143 bytes, checksum: 8f0598c283265dc7e760b07a79964661 (MD5) Previous issue date: 1997","Embargo set by: Seth Robbins for item 84175 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","U of I Only","122 p.","Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1997."],"dc:identifier":["http://hdl.handle.net/2142/82894","(MiAaPQ)AAI9812759"],"dc:language":["eng"],"dc:subject":["Engineering, Materials Science"],"dc:title":["Study of Charged Liquid Cluster Beam Generation and Application to Processing of Thin Films and Nanoparticles"],"dc:type":["text"],"thesis:degree_discipline":["Materials Science and Engineering"],"thesis:degree_level":["Dissertation"],"thesis:degree_name":["Ph.D."],"thesis:institution_name":["University of Illinois at Urbana-Champaign"]},"updated_at":"2026-07-22T22:26:20Z"}