{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/82885"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/82885","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"Kinetic and Microstructural Study of Titanium Nitride Deposited by Laser Chemical Vapor Deposition","abstract":"The deposition apparent activation energy was calculated as 122 $\\pm$ 9 kJ/mole using growth rates measured by film height and 117 $\\pm$ 23 kJ/mole using growth rates measured by LIF signals. This puts the process in the surface kinetic growth regime over the temperature range 1370-1610 K. Above N$\\sb2$ and H$\\sb2$ levels of 1.25% and below TiCl$\\sb4$ input of 4.5%, the growth rate has a half-order dependence on nitrogen and a linear dependence on hydrogen and is approximated by$$\\rm r = {{kP\\sb{TiCl\\sb4}P\\sb{H\\sb2}P\\sbsp{N\\sb2}{1/2}exp\\left({{-}E\\sb{a}\\over {RT}\\right)}\\over{1 + P\\sb{Ar}}}}.$$Since nitrogen positively affects growth rate (when added to a TiCl$\\sb4$+H$\\sb2$ mixture), stepwise reduction of TiCl$\\sb4$ to Ti by hydrogen does not occur. $\\rm NH\\sb{x}$ complexes are clearly involved in the growth mechanism; a likely combination of rate determining steps is the formation of NH and the initial reduction of TiCl$\\sb4$ by hydrogen.","abstract_html":"The deposition apparent activation energy was calculated as 122 $\\pm$ 9 kJ/mole using growth rates measured by film height and 117 $\\pm$ 23 kJ/mole using growth rates measured by LIF signals. This puts the process in the surface kinetic growth regime over the temperature range 1370-1610 K. Above N$\\sb2$ and H$\\sb2$ levels of 1.25% and below TiCl$\\sb4$ input of 4.5%, the growth rate has a half-order dependence on nitrogen and a linear dependence on hydrogen and is approximated by$$\\rm r = {{kP\\sb{TiCl\\sb4}P\\sb{H\\sb2}P\\sbsp{N\\sb2}{1/2}exp\\left({{-}E\\sb{a}\\over {RT}\\right)}\\over{1 + P\\sb{Ar}}}}.$$Since nitrogen positively affects growth rate (when added to a TiCl$\\sb4$+H$\\sb2$ mixture), stepwise reduction of TiCl$\\sb4$ to Ti by hydrogen does not occur. $\\rm NH\\sb{x}$ complexes are clearly involved in the growth mechanism; a likely combination of rate determining steps is the formation of NH and the initial reduction of TiCl$\\sb4$ by hydrogen.","abstract_has_math":true,"creators":["Egland, Keith Maynard"],"institution":"University of Illinois at Urbana-Champaign","degree_name":"Ph.D.","degree_level":"Dissertation","degree_discipline":"Materials Science and Engineering","degree_department":null,"school":null,"contributors":["Mazumder, Jyotirmoy"],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2015,"date_issued":"2015-09-25T20:53:29Z","date_published":"2015-09-25T20:53:29Z","updated_at":"2026-07-22T22:26:20Z","subjects":["Engineering, Materials Science"],"languages":["eng"],"rights":[],"rights_urls":[],"identifier_entries":[{"key":"dc:identifier","label":"Identifier","values":["(MiAaPQ)AAI9812578"],"render_values":[{"text":"(MiAaPQ)AAI9812578","href":null,"code":true}]}]},"links":{"outbound_url":"http://hdl.handle.net/2142/82885","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Mazumder, Jyotirmoy"]},{"key":"dc:creator","label":"Author","values":["Egland, Keith Maynard"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2015-09-25T20:53:29Z","10000-01-01","1997"]},{"key":"dc:type","label":"Dc Type","values":["text"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Materials Science and Engineering"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Dissertation"]},{"key":"thesis:degree_name","label":"Degree Name","values":["Ph.D."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Engineering, Materials Science"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["eng"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["http://hdl.handle.net/2142/82885","(MiAaPQ)AAI9812578"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["The deposition apparent activation energy was calculated as 122 $\\pm$ 9 kJ/mole using growth rates measured by film height and 117 $\\pm$ 23 kJ/mole using growth rates measured by LIF signals. This puts the process in the surface kinetic growth regime over the temperature range 1370-1610 K. Above N$\\sb2$ and H$\\sb2$ levels of 1.25% and below TiCl$\\sb4$ input of 4.5%, the growth rate has a half-order dependence on nitrogen and a linear dependence on hydrogen and is approximated by$$\\rm r = {{kP\\sb{TiCl\\sb4}P\\sb{H\\sb2}P\\sbsp{N\\sb2}{1/2}exp\\left({{-}E\\sb{a}\\over {RT}\\right)}\\over{1 + P\\sb{Ar}}}}.$$Since nitrogen positively affects growth rate (when added to a TiCl$\\sb4$+H$\\sb2$ mixture), stepwise reduction of TiCl$\\sb4$ to Ti by hydrogen does not occur. $\\rm NH\\sb{x}$ complexes are clearly involved in the growth mechanism; a likely combination of rate determining steps is the formation of NH and the initial reduction of TiCl$\\sb4$ by hydrogen.","Made available in DSpace on 2015-09-25T20:53:29Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 9812578.pdf: 5557041 bytes, checksum: a1117bfdca797ace082356ff5e7e5cab (MD5) Previous issue date: 1997","Embargo set by: Seth Robbins for item 84166 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","U of I Only","138 p.","Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1997."]},{"key":"dc:title","label":"Title","values":["Kinetic and Microstructural Study of Titanium Nitride Deposited by Laser Chemical Vapor Deposition"]}]}],"canonical_facts":{"dc:contributor":["Mazumder, Jyotirmoy"],"dc:creator":["Egland, Keith Maynard"],"dc:date":["2015-09-25T20:53:29Z","10000-01-01","1997"],"dc:description":["The deposition apparent activation energy was calculated as 122 $\\pm$ 9 kJ/mole using growth rates measured by film height and 117 $\\pm$ 23 kJ/mole using growth rates measured by LIF signals. This puts the process in the surface kinetic growth regime over the temperature range 1370-1610 K. Above N$\\sb2$ and H$\\sb2$ levels of 1.25% and below TiCl$\\sb4$ input of 4.5%, the growth rate has a half-order dependence on nitrogen and a linear dependence on hydrogen and is approximated by$$\\rm r = {{kP\\sb{TiCl\\sb4}P\\sb{H\\sb2}P\\sbsp{N\\sb2}{1/2}exp\\left({{-}E\\sb{a}\\over {RT}\\right)}\\over{1 + P\\sb{Ar}}}}.$$Since nitrogen positively affects growth rate (when added to a TiCl$\\sb4$+H$\\sb2$ mixture), stepwise reduction of TiCl$\\sb4$ to Ti by hydrogen does not occur. $\\rm NH\\sb{x}$ complexes are clearly involved in the growth mechanism; a likely combination of rate determining steps is the formation of NH and the initial reduction of TiCl$\\sb4$ by hydrogen.","Made available in DSpace on 2015-09-25T20:53:29Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 9812578.pdf: 5557041 bytes, checksum: a1117bfdca797ace082356ff5e7e5cab (MD5) Previous issue date: 1997","Embargo set by: Seth Robbins for item 84166 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","U of I Only","138 p.","Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1997."],"dc:identifier":["http://hdl.handle.net/2142/82885","(MiAaPQ)AAI9812578"],"dc:language":["eng"],"dc:subject":["Engineering, Materials Science"],"dc:title":["Kinetic and Microstructural Study of Titanium Nitride Deposited by Laser Chemical Vapor Deposition"],"dc:type":["text"],"thesis:degree_discipline":["Materials Science and Engineering"],"thesis:degree_level":["Dissertation"],"thesis:degree_name":["Ph.D."],"thesis:institution_name":["University of Illinois at Urbana-Champaign"]},"updated_at":"2026-07-22T22:26:20Z"}