{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/82780"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/82780","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"Advanced Soft Lithography and Microstructured Semiconductors (mus-Sc) for Macroelectronics","abstract":"U of I Only","abstract_html":"U of I Only","abstract_has_math":false,"creators":["Lee, Keon Jae"],"institution":"University of Illinois at Urbana-Champaign","degree_name":"Ph.D.","degree_level":"Dissertation","degree_discipline":"Materials Science and Engineering","degree_department":null,"school":null,"contributors":["Nuzzo, Ralph G."],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2015,"date_issued":"2015-09-25T20:53:00Z","date_published":"2015-09-25T20:53:00Z","updated_at":"2026-07-22T22:26:18Z","subjects":["Engineering, Electronics and Electrical"],"languages":["eng"],"rights":[],"rights_urls":[],"identifier_entries":[{"key":"dc:identifier","label":"Identifier","values":["(MiAaPQ)AAI3223643"],"render_values":[{"text":"(MiAaPQ)AAI3223643","href":null,"code":true}]}]},"links":{"outbound_url":"http://hdl.handle.net/2142/82780","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Nuzzo, Ralph G."]},{"key":"dc:creator","label":"Author","values":["Lee, Keon Jae"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2015-09-25T20:53:00Z","10000-01-01","2006"]},{"key":"dc:type","label":"Dc Type","values":["text"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Materials Science and Engineering"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Dissertation"]},{"key":"thesis:degree_name","label":"Degree Name","values":["Ph.D."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Engineering, Electronics and Electrical"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["eng"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["http://hdl.handle.net/2142/82780","(MiAaPQ)AAI3223643"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["U of I Only","Another main focus of my research is macroelectronics, referred to flexible and large area electronics. We employed newly developed technology from our group, called microstructured semiconductor (mus-Sc) that carved from bulk single crystal wafer using the standard microfabrication process. Soft lithographic approach was used to print this form of mus-Sc onto plastic substrate and it overcame many current limitations of the flexible electronics. High performance mus-Sc devices using both single crystal Si and GaN materials were successfully fabricated on plastic substrate.","Made available in DSpace on 2015-09-25T20:53:00Z (GMT). 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We employed newly developed technology from our group, called microstructured semiconductor (mus-Sc) that carved from bulk single crystal wafer using the standard microfabrication process. Soft lithographic approach was used to print this form of mus-Sc onto plastic substrate and it overcame many current limitations of the flexible electronics. High performance mus-Sc devices using both single crystal Si and GaN materials were successfully fabricated on plastic substrate.","Made available in DSpace on 2015-09-25T20:53:00Z (GMT). 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