{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/82748"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/82748","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"Nucleation Kinetics During Homoepitaxial Growth of Titanium Nitride(001) by Reactive Magnetron Sputtering","abstract":"I use scanning tunneling microscopy to study the nucleation of homoepitaxial stoichiometric TiN layers grown on TiN(001) by ultrahigh vacuum reactive magnetron sputtering in pure N2. Nucleation lengths are measured using in-situ scanning tunneling microscopy as a function of temperature and nitrogen gas fraction fN2 in an Ar/N2 gas mixture on two-dimensional islands as well as on large open terraces. The characteristic island size Rc necessary to nucleate a new layer decreases continuously with fN2 , varying from 18.0 nm at Ts = 740°C with fN2 = 0.10 to 11.2 nm with fN2 = 1.00. At low growth temperatures, 500 ≤ Ts ≤ 865°C, nucleation is diffusion limited independent of fN2 and I extract a surface diffusion energy of 1.1 +/- 0.1 eV for TiN(001) growth with fN2 = 0.10 and 1.4 +/- 0.1 eV in pure N2. At higher temperatures, 865 < Ts ≤ 1010°C, nucleation is limited by the formation rate of stable clusters for which I obtain an activation energy of 2.4 +/- 0.2 eV with fN2 = 0.10 and 2.6 +/- 0.2 eV with fN2 = 1.00. Ab-initio calculations combined with my experimental results suggest that the primary diffusing adspecies during growth of TiN(001) in pure nitrogen are TiNx molecules with x = 2 and/or 3. I attribute the decrease in Es for growth at fN2 = 0.10 to a lower steady-state N coverage resulting in a decrease in x.","abstract_html":"I use scanning tunneling microscopy to study the nucleation of homoepitaxial stoichiometric TiN layers grown on TiN(001) by ultrahigh vacuum reactive magnetron sputtering in pure N2. Nucleation lengths are measured using in-situ scanning tunneling microscopy as a function of temperature and nitrogen gas fraction fN2 in an Ar/N2 gas mixture on two-dimensional islands as well as on large open terraces. The characteristic island size Rc necessary to nucleate a new layer decreases continuously with fN2 , varying from 18.0 nm at Ts = 740&deg;C with fN2 = 0.10 to 11.2 nm with fN2 = 1.00. At low growth temperatures, 500 &le; Ts &le; 865&deg;C, nucleation is diffusion limited independent of fN2 and I extract a surface diffusion energy of 1.1 +/- 0.1 eV for TiN(001) growth with fN2 = 0.10 and 1.4 +/- 0.1 eV in pure N2. At higher temperatures, 865 < Ts &le; 1010&deg;C, nucleation is limited by the formation rate of stable clusters for which I obtain an activation energy of 2.4 +/- 0.2 eV with fN2 = 0.10 and 2.6 +/- 0.2 eV with fN2 = 1.00. Ab-initio calculations combined with my experimental results suggest that the primary diffusing adspecies during growth of TiN(001) in pure nitrogen are TiNx molecules with x = 2 and/or 3. I attribute the decrease in Es for growth at fN2 = 0.10 to a lower steady-state N coverage resulting in a decrease in x.","abstract_has_math":false,"creators":["Wall, Marcel Arlan"],"institution":"University of Illinois at Urbana-Champaign","degree_name":"Ph.D.","degree_level":"Dissertation","degree_discipline":"Materials Science and Engineering","degree_department":null,"school":null,"contributors":["Cahill, David G.","Greene, J.E."],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2015,"date_issued":"2015-09-25T20:52:49Z","date_published":"2015-09-25T20:52:49Z","updated_at":"2026-07-22T22:26:18Z","subjects":["Engineering, Materials Science"],"languages":["eng"],"rights":[],"rights_urls":[],"identifier_entries":[{"key":"dc:identifier","label":"Identifier","values":["(MiAaPQ)AAI3111653"],"render_values":[{"text":"(MiAaPQ)AAI3111653","href":null,"code":true}]}]},"links":{"outbound_url":"http://hdl.handle.net/2142/82748","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Cahill, David G.","Greene, J.E."]},{"key":"dc:creator","label":"Author","values":["Wall, Marcel Arlan"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2015-09-25T20:52:49Z","10000-01-01","2003"]},{"key":"dc:type","label":"Dc Type","values":["text"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Materials Science and Engineering"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Dissertation"]},{"key":"thesis:degree_name","label":"Degree Name","values":["Ph.D."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Engineering, Materials Science"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["eng"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["http://hdl.handle.net/2142/82748","(MiAaPQ)AAI3111653"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["I use scanning tunneling microscopy to study the nucleation of homoepitaxial stoichiometric TiN layers grown on TiN(001) by ultrahigh vacuum reactive magnetron sputtering in pure N2. Nucleation lengths are measured using in-situ scanning tunneling microscopy as a function of temperature and nitrogen gas fraction fN2 in an Ar/N2 gas mixture on two-dimensional islands as well as on large open terraces. The characteristic island size Rc necessary to nucleate a new layer decreases continuously with fN2 , varying from 18.0 nm at Ts = 740°C with fN2 = 0.10 to 11.2 nm with fN2 = 1.00. At low growth temperatures, 500 ≤ Ts ≤ 865°C, nucleation is diffusion limited independent of fN2 and I extract a surface diffusion energy of 1.1 +/- 0.1 eV for TiN(001) growth with fN2 = 0.10 and 1.4 +/- 0.1 eV in pure N2. At higher temperatures, 865 < Ts ≤ 1010°C, nucleation is limited by the formation rate of stable clusters for which I obtain an activation energy of 2.4 +/- 0.2 eV with fN2 = 0.10 and 2.6 +/- 0.2 eV with fN2 = 1.00. Ab-initio calculations combined with my experimental results suggest that the primary diffusing adspecies during growth of TiN(001) in pure nitrogen are TiNx molecules with x = 2 and/or 3. I attribute the decrease in Es for growth at fN2 = 0.10 to a lower steady-state N coverage resulting in a decrease in x.","Made available in DSpace on 2015-09-25T20:52:49Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 3111653.pdf: 4665513 bytes, checksum: 071e4e7cc9a0409847940999ae657f58 (MD5) Previous issue date: 2003","Embargo set by: Seth Robbins for item 84029 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","U of I Only","113 p.","Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2003."]},{"key":"dc:title","label":"Title","values":["Nucleation Kinetics During Homoepitaxial Growth of Titanium Nitride(001) by Reactive Magnetron Sputtering"]}]}],"canonical_facts":{"dc:contributor":["Cahill, David G.","Greene, J.E."],"dc:creator":["Wall, Marcel Arlan"],"dc:date":["2015-09-25T20:52:49Z","10000-01-01","2003"],"dc:description":["I use scanning tunneling microscopy to study the nucleation of homoepitaxial stoichiometric TiN layers grown on TiN(001) by ultrahigh vacuum reactive magnetron sputtering in pure N2. Nucleation lengths are measured using in-situ scanning tunneling microscopy as a function of temperature and nitrogen gas fraction fN2 in an Ar/N2 gas mixture on two-dimensional islands as well as on large open terraces. The characteristic island size Rc necessary to nucleate a new layer decreases continuously with fN2 , varying from 18.0 nm at Ts = 740°C with fN2 = 0.10 to 11.2 nm with fN2 = 1.00. At low growth temperatures, 500 ≤ Ts ≤ 865°C, nucleation is diffusion limited independent of fN2 and I extract a surface diffusion energy of 1.1 +/- 0.1 eV for TiN(001) growth with fN2 = 0.10 and 1.4 +/- 0.1 eV in pure N2. At higher temperatures, 865 < Ts ≤ 1010°C, nucleation is limited by the formation rate of stable clusters for which I obtain an activation energy of 2.4 +/- 0.2 eV with fN2 = 0.10 and 2.6 +/- 0.2 eV with fN2 = 1.00. Ab-initio calculations combined with my experimental results suggest that the primary diffusing adspecies during growth of TiN(001) in pure nitrogen are TiNx molecules with x = 2 and/or 3. I attribute the decrease in Es for growth at fN2 = 0.10 to a lower steady-state N coverage resulting in a decrease in x.","Made available in DSpace on 2015-09-25T20:52:49Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 3111653.pdf: 4665513 bytes, checksum: 071e4e7cc9a0409847940999ae657f58 (MD5) Previous issue date: 2003","Embargo set by: Seth Robbins for item 84029 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","U of I Only","113 p.","Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2003."],"dc:identifier":["http://hdl.handle.net/2142/82748","(MiAaPQ)AAI3111653"],"dc:language":["eng"],"dc:subject":["Engineering, Materials Science"],"dc:title":["Nucleation Kinetics During Homoepitaxial Growth of Titanium Nitride(001) by Reactive Magnetron Sputtering"],"dc:type":["text"],"thesis:degree_discipline":["Materials Science and Engineering"],"thesis:degree_level":["Dissertation"],"thesis:degree_name":["Ph.D."],"thesis:institution_name":["University of Illinois at Urbana-Champaign"]},"updated_at":"2026-07-22T22:26:18Z"}