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We discuss the future use of these electrical characterization techniques to analyze the properties of individual grain boundaries in thin film Si bicrystals formed by SLS.","Embargo set by: Seth Robbins for item 83991 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","U of I Only","109 p.","Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2001."]},{"key":"dc:title","label":"Title","values":["Low-Temperature Silicon Thin Films for Large-Area Electronics: Device Fabrication Using Soft Lithography and Laser-Crystallization by Sequential Lateral Solidification"]}]}],"canonical_facts":{"dc:contributor":["Abelson, John Robert"],"dc:creator":["Jin, Hyun-Chul"],"dc:date":["2015-09-25T20:52:35Z","10000-01-01","2001"],"dc:description":["Made available in DSpace on 2015-09-25T20:52:35Z (GMT). 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