{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/82406"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/82406","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"Multiscale Simulation of Copper Nucleation on Gold","abstract":"The simulation model was linked to a continuum resistive-substrate code in order to simulate copper nucleation along a resistive gold substrate. The linkage was achieved in a manner similar to Sequential Coupling, eliminating the need for parallel communication between KMC simulations along the substrate with each other and with the resistive substrate code. Further analysis of the chemical mechanism and simulation model were earned out using results of the resistive substrate simulations. It was found that the height and uniformity of nucleation and growth are highly dependent on the applied potential, and that the presence or absence of selective suppression greatly influenced the uniformity of growth. Possible inaccuracies in the estimated parameters were identified by intermittent spiked growth observed in the KCM simulations, and further simulation studies were recommended.","abstract_html":"The simulation model was linked to a continuum resistive-substrate code in order to simulate copper nucleation along a resistive gold substrate. The linkage was achieved in a manner similar to Sequential Coupling, eliminating the need for parallel communication between KMC simulations along the substrate with each other and with the resistive substrate code. Further analysis of the chemical mechanism and simulation model were earned out using results of the resistive substrate simulations. It was found that the height and uniformity of nucleation and growth are highly dependent on the applied potential, and that the presence or absence of selective suppression greatly influenced the uniformity of growth. Possible inaccuracies in the estimated parameters were identified by intermittent spiked growth observed in the KCM simulations, and further simulation studies were recommended.","abstract_has_math":false,"creators":["Karulkar, Mohan"],"institution":"University of Illinois at Urbana-Champaign","degree_name":"Ph.D.","degree_level":"Dissertation","degree_discipline":"Chemical Engineering","degree_department":null,"school":null,"contributors":["Alkire, Richard C."],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2015,"date_issued":"2015-09-25T20:43:36Z","date_published":"2015-09-25T20:43:36Z","updated_at":"2026-07-22T22:26:18Z","subjects":["Engineering, Chemical"],"languages":["eng"],"rights":[],"rights_urls":[],"identifier_entries":[{"key":"dc:identifier","label":"Identifier","values":["(MiAaPQ)AAI3301160"],"render_values":[{"text":"(MiAaPQ)AAI3301160","href":null,"code":true}]}]},"links":{"outbound_url":"http://hdl.handle.net/2142/82406","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Alkire, Richard C."]},{"key":"dc:creator","label":"Author","values":["Karulkar, Mohan"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2015-09-25T20:43:36Z","10000-01-01","2007"]},{"key":"dc:type","label":"Dc Type","values":["text"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Chemical Engineering"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Dissertation"]},{"key":"thesis:degree_name","label":"Degree Name","values":["Ph.D."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Engineering, Chemical"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["eng"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["http://hdl.handle.net/2142/82406","(MiAaPQ)AAI3301160"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["The simulation model was linked to a continuum resistive-substrate code in order to simulate copper nucleation along a resistive gold substrate. The linkage was achieved in a manner similar to Sequential Coupling, eliminating the need for parallel communication between KMC simulations along the substrate with each other and with the resistive substrate code. Further analysis of the chemical mechanism and simulation model were earned out using results of the resistive substrate simulations. It was found that the height and uniformity of nucleation and growth are highly dependent on the applied potential, and that the presence or absence of selective suppression greatly influenced the uniformity of growth. Possible inaccuracies in the estimated parameters were identified by intermittent spiked growth observed in the KCM simulations, and further simulation studies were recommended.","Made available in DSpace on 2015-09-25T20:43:36Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 3301160.pdf: 3068225 bytes, checksum: 77b1ef589c5f2c38199da3870a4892b3 (MD5) Previous issue date: 2007","Embargo set by: Seth Robbins for item 83687 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","U of I Only","131 p.","Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2007."]},{"key":"dc:title","label":"Title","values":["Multiscale Simulation of Copper Nucleation on Gold"]}]}],"canonical_facts":{"dc:contributor":["Alkire, Richard C."],"dc:creator":["Karulkar, Mohan"],"dc:date":["2015-09-25T20:43:36Z","10000-01-01","2007"],"dc:description":["The simulation model was linked to a continuum resistive-substrate code in order to simulate copper nucleation along a resistive gold substrate. The linkage was achieved in a manner similar to Sequential Coupling, eliminating the need for parallel communication between KMC simulations along the substrate with each other and with the resistive substrate code. Further analysis of the chemical mechanism and simulation model were earned out using results of the resistive substrate simulations. It was found that the height and uniformity of nucleation and growth are highly dependent on the applied potential, and that the presence or absence of selective suppression greatly influenced the uniformity of growth. Possible inaccuracies in the estimated parameters were identified by intermittent spiked growth observed in the KCM simulations, and further simulation studies were recommended.","Made available in DSpace on 2015-09-25T20:43:36Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 3301160.pdf: 3068225 bytes, checksum: 77b1ef589c5f2c38199da3870a4892b3 (MD5) Previous issue date: 2007","Embargo set by: Seth Robbins for item 83687 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","U of I Only","131 p.","Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2007."],"dc:identifier":["http://hdl.handle.net/2142/82406","(MiAaPQ)AAI3301160"],"dc:language":["eng"],"dc:subject":["Engineering, Chemical"],"dc:title":["Multiscale Simulation of Copper Nucleation on Gold"],"dc:type":["text"],"thesis:degree_discipline":["Chemical Engineering"],"thesis:degree_level":["Dissertation"],"thesis:degree_name":["Ph.D."],"thesis:institution_name":["University of Illinois at Urbana-Champaign"]},"updated_at":"2026-07-22T22:26:18Z"}