Measurement of the Electron Density and the Attachment Rate Coefficient in Silane/helium Discharges
type: CreativeWork
description: The electron density in helium and silane/helium glow discharge plasmas was measured in a hollow cathode discharge using microwave diagnostic techniques. When silane is added to the discharge gas, the electron density is drastically reduced, which is attributed to dissociative attachment to a product of the dissociation of the parent silane molecules, either SiH(,2) or SiH(,3). The rate coefficient for the dissociative attachment process was determined to be 2.65 x 10('-10) cm('3)/sec. This indicates that the attachment of electrons by silane fragments is an important kinetic process in silane discharges, and should be considered in models of the glow discharge deposition process.
abstract: The electron density in helium and silane/helium glow discharge plasmas was measured in a hollow cathode discharge using microwave diagnostic techniques. When silane is added to the discharge gas, the electron density is drastically reduced, which is attributed to dissociative attachment to a product of the dissociation of the parent silane molecules, either SiH(,2) or SiH(,3). The rate coefficient for the dissociative attachment process was determined to be 2.65 x 10('-10) cm('3)/sec. This indicates that the attachment of electrons by silane fragments is an important kinetic process in silane discharges, and should be considered in models of the glow discharge deposition process.
author: Fleddermann, Charles Byrns
keywords: Engineering, Electronics and Electrical
date published: 2014-12-15T19:05:00Z
date modified: 2026-07-22T22:26:00Z
provider: University of Illinois - Urbana-Champaign
publisher: Networked Digital Library of Theses and Dissertations
type: WebPage
source organization: University of Illinois at Urbana-Champaign

PropertyValue
property ID: Handle
value: http://hdl.handle.net/2142/69317