{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/24051"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/24051","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"X-ray photoelectron spectroscopy (XPS) study of single crystal UO2 and U3O8 on r-plane sapphire and yttrium stabilized zirconium (YSZ) substrates","abstract":"The purpose of the work performed in this thesis is to demonstrate the ability of a magnetron sputtering system to grow single crystal thin films of Uranium Oxides with and without specifically added Neodymium impurities. To do this we analyzed our thin films using X-ray Photoelectron Spectroscopy (XPS), X-ray Diffraction (XRD), Rutherford Backscattering Spectroscopy (RBS), and Secondary Ion Mass Spectroscopy (SIMS). This thesis will primarily focus on the growth of the thin films, and the analyzed results from X-ray Photoelectron Spectroscopy and X-ray Diffraction. The analysis of thin films of UO2 and U3O8 is a relatively new field with minimal data on thin films. There is however some work on bulk UO2 and U3O8. We will be able to compare our data to the data from bulk UO2 and U3O8 and predict the results from basic XPS and XRD theory. Observations to the thin films structural and electronic states will be made in comparison to bulk material. This will allow us to observe phenomenon such as oxidation, diffusion, and actinide incorporation within the film. Also, we will discuss the use of two different substrates and the quality of film that is produced during growth. Ultimately, this study will demonstrate the quality of our films and recommend the best substrate to be used in future film growth.","abstract_html":"The purpose of the work performed in this thesis is to demonstrate the ability of a magnetron sputtering system to grow single crystal thin films of Uranium Oxides with and without specifically added Neodymium impurities. To do this we analyzed our thin films using X-ray Photoelectron Spectroscopy (XPS), X-ray Diffraction (XRD), Rutherford Backscattering Spectroscopy (RBS), and Secondary Ion Mass Spectroscopy (SIMS). This thesis will primarily focus on the growth of the thin films, and the analyzed results from X-ray Photoelectron Spectroscopy and X-ray Diffraction. The analysis of thin films of UO2 and U3O8 is a relatively new field with minimal data on thin films. There is however some work on bulk UO2 and U3O8. We will be able to compare our data to the data from bulk UO2 and U3O8 and predict the results from basic XPS and XRD theory. Observations to the thin films structural and electronic states will be made in comparison to bulk material. This will allow us to observe phenomenon such as oxidation, diffusion, and actinide incorporation within the film. Also, we will discuss the use of two different substrates and the quality of film that is produced during growth. Ultimately, this study will demonstrate the quality of our films and recommend the best substrate to be used in future film growth.","abstract_has_math":false,"creators":["Strehle, Melissa M."],"institution":"University of Illinois at Urbana-Champaign","degree_name":"M.S.","degree_level":"Thesis","degree_discipline":"Nuclear, Plasma, Radiolgc Engr","degree_department":null,"school":null,"contributors":["Heuser, Brent J."],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2011,"date_issued":"2011-05-25T14:55:23Z","date_published":"2011-05-25T14:55:23Z","updated_at":"2026-07-22T22:25:23Z","subjects":["Uranium oxide","UO2","U3O8","yttrium stabilized zirconium (YSZ)","R-plane Sapphire"],"languages":["en"],"rights":["Copyright 2011 Melissa M. Strehle"],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":"http://hdl.handle.net/2142/24051","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Heuser, Brent J."]},{"key":"dc:creator","label":"Author","values":["Strehle, Melissa M."]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2011-05-25T14:55:23Z","2011-05"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Nuclear, Plasma, Radiolgc Engr"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Thesis"]},{"key":"thesis:degree_name","label":"Degree Name","values":["M.S."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Uranium oxide","UO2","U3O8","yttrium stabilized zirconium (YSZ)","R-plane Sapphire"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["en"]},{"key":"dc:rights","label":"Dc Rights","values":["Copyright 2011 Melissa M. 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We will be able to compare our data to the data from bulk UO2 and U3O8 and predict the results from basic XPS and XRD theory. Observations to the thin films structural and electronic states will be made in comparison to bulk material. This will allow us to observe phenomenon such as oxidation, diffusion, and actinide incorporation within the film. Also, we will discuss the use of two different substrates and the quality of film that is produced during growth. Ultimately, this study will demonstrate the quality of our films and recommend the best substrate to be used in future film growth.","Item withdrawn by Alexis Thompson (athmpsn1@illinois.edu) on 2011-04-22T15:38:01Z Item was in collections: University of Illinois Theses & Dissertations (ID: 1) No. of bitstreams: 2 Strehle_Melissa.docx: 2545959 bytes, checksum: 62f343aa78bf54f8bb844bc01c2d3723 (MD5) Strehle_Melissa.pdf: 1679055 bytes, checksum: 936eb4dbf58c4424f12d048e6817a5f9 (MD5)","Made available in DSpace on 2011-05-25T14:55:23Z (GMT). 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To do this we analyzed our thin films using X-ray Photoelectron Spectroscopy (XPS), X-ray Diffraction (XRD), Rutherford Backscattering Spectroscopy (RBS), and Secondary Ion Mass Spectroscopy (SIMS). This thesis will primarily focus on the growth of the thin films, and the analyzed results from X-ray Photoelectron Spectroscopy and X-ray Diffraction. The analysis of thin films of UO2 and U3O8 is a relatively new field with minimal data on thin films. There is however some work on bulk UO2 and U3O8. We will be able to compare our data to the data from bulk UO2 and U3O8 and predict the results from basic XPS and XRD theory. Observations to the thin films structural and electronic states will be made in comparison to bulk material. This will allow us to observe phenomenon such as oxidation, diffusion, and actinide incorporation within the film. Also, we will discuss the use of two different substrates and the quality of film that is produced during growth. Ultimately, this study will demonstrate the quality of our films and recommend the best substrate to be used in future film growth.","Item withdrawn by Alexis Thompson (athmpsn1@illinois.edu) on 2011-04-22T15:38:01Z Item was in collections: University of Illinois Theses & Dissertations (ID: 1) No. of bitstreams: 2 Strehle_Melissa.docx: 2545959 bytes, checksum: 62f343aa78bf54f8bb844bc01c2d3723 (MD5) Strehle_Melissa.pdf: 1679055 bytes, checksum: 936eb4dbf58c4424f12d048e6817a5f9 (MD5)","Made available in DSpace on 2011-05-25T14:55:23Z (GMT). No. of bitstreams: 3 Strehle_Melissa.pdf: 1679850 bytes, checksum: abe9ac31c41d63c6294f22f0bee18770 (MD5) license.txt: 4065 bytes, checksum: 45cee5340663bc24ac62121b69a058b0 (MD5) Strehle_Melissa.docx: 2545090 bytes, checksum: 94d75fef0bff10e6c3d19459384c69b8 (MD5)"],"dc:identifier":["http://hdl.handle.net/2142/24051"],"dc:language":["en"],"dc:rights":["Copyright 2011 Melissa M. Strehle"],"dc:subject":["Uranium oxide","UO2","U3O8","yttrium stabilized zirconium (YSZ)","R-plane Sapphire"],"dc:title":["X-ray photoelectron spectroscopy (XPS) study of single crystal UO2 and U3O8 on r-plane sapphire and yttrium stabilized zirconium (YSZ) substrates"],"thesis:degree_discipline":["Nuclear, Plasma, Radiolgc Engr"],"thesis:degree_level":["Thesis"],"thesis:degree_name":["M.S."],"thesis:institution_name":["University of Illinois at Urbana-Champaign"]},"updated_at":"2026-07-22T22:25:23Z"}