{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/23123"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/23123","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"Surface diffusion processes critical to metallic film nucleation and growth: An atomic view","abstract":"\"Extensive computer simulations have been performed to study diffusion processes critical to nucleation and growth of metallic thin films. Diffusion behavior of (1) single adatoms on a flat surface, (2) single adatoms near and at steps on a vicinal surface, and (3) small adatom cluster migration on terraces and (4) single vacancies on a flat surface has been investigated. Many important results have been found. For instance, (i) For adatom diffusion near steps on Ni(111) there exists a \"\"forbidden\"\" region near steps. The adatoms have to overcome a slightly higher energy barrier to get into the \"\"forbidden\"\" region. This is consistent with the latest FIM experiments for Ir adatom diffusion near Ir clusters on Ir(111). (ii) Exchange diffusion at descending steps of type B on Ni(111) was found to be energetically favored and is the dominant mechanism for incorporation of adatoms over descending steps into the step ledges. This is consistent with earlier FIM experiments for W adatom diffusion at Ir cluster steps on Ir(111). (iii) Diffusion of adatoms along the step ledges can be either enhanced, as on Ni(100), or hindered, as on Ni(111). (iv) For the first time an exchange mechanism was found to be favored at descending steps on Ni(110) and (100). (v) The energy barriers for vacancy diffusion on five fcc surfaces were found to be higher than those for single adatom diffusion. (vi) Small clusters migrate in different fashions on different surfaces: on Ni(100) they move through a series of individual jumps of single atoms in the clusters; on Ni(111), for the first time they were found to migrate by concerted jumps of all the atoms in the clusters. The trend in the energy barriers on both surfaces was found to be consistent with available FIM experimental data.\"","abstract_html":""Extensive computer simulations have been performed to study diffusion processes critical to nucleation and growth of metallic thin films. Diffusion behavior of (1) single adatoms on a flat surface, (2) single adatoms near and at steps on a vicinal surface, and (3) small adatom cluster migration on terraces and (4) single vacancies on a flat surface has been investigated. Many important results have been found. For instance, (i) For adatom diffusion near steps on Ni(111) there exists a ""forbidden"" region near steps. The adatoms have to overcome a slightly higher energy barrier to get into the ""forbidden"" region. This is consistent with the latest FIM experiments for Ir adatom diffusion near Ir clusters on Ir(111). (ii) Exchange diffusion at descending steps of type B on Ni(111) was found to be energetically favored and is the dominant mechanism for incorporation of adatoms over descending steps into the step ledges. This is consistent with earlier FIM experiments for W adatom diffusion at Ir cluster steps on Ir(111). (iii) Diffusion of adatoms along the step ledges can be either enhanced, as on Ni(100), or hindered, as on Ni(111). (iv) For the first time an exchange mechanism was found to be favored at descending steps on Ni(110) and (100). (v) The energy barriers for vacancy diffusion on five fcc surfaces were found to be higher than those for single adatom diffusion. (vi) Small clusters migrate in different fashions on different surfaces: on Ni(100) they move through a series of individual jumps of single atoms in the clusters; on Ni(111), for the first time they were found to migrate by concerted jumps of all the atoms in the clusters. The trend in the energy barriers on both surfaces was found to be consistent with available FIM experimental data."","abstract_has_math":false,"creators":["Liu, Chun-Li"],"institution":"University of Illinois at Urbana-Champaign","degree_name":"Ph.D.","degree_level":"Dissertation","degree_discipline":"Engineering, Chemical","degree_department":null,"school":null,"contributors":["Adams, James B."],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2011,"date_issued":"2011-05-07T14:03:00Z","date_published":"2011-05-07T14:03:00Z","updated_at":"2026-07-22T22:25:21Z","subjects":["Engineering, Chemical","Engineering, Metallurgy","Engineering, Materials Science"],"languages":["eng"],"rights":["Copyright 1993 Liu, Chun-Li"],"rights_urls":[],"identifier_entries":[{"key":"dc:identifier","label":"Identifier","values":["AAI9314906","(UMI)AAI9314906"],"render_values":[{"text":"AAI9314906","href":null,"code":true},{"text":"(UMI)AAI9314906","href":null,"code":true}]}]},"links":{"outbound_url":"http://hdl.handle.net/2142/23123","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Adams, James B."]},{"key":"dc:creator","label":"Author","values":["Liu, Chun-Li"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2011-05-07T14:03:00Z","10000-01-01","1993"]},{"key":"dc:type","label":"Dc Type","values":["text"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Engineering, Chemical","Engineering, Metallurgy","Engineering, Materials Science"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Dissertation"]},{"key":"thesis:degree_name","label":"Degree Name","values":["Ph.D."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Engineering, Chemical","Engineering, Metallurgy","Engineering, Materials Science"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["eng"]},{"key":"dc:rights","label":"Dc Rights","values":["Copyright 1993 Liu, Chun-Li"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["AAI9314906","(UMI)AAI9314906","http://hdl.handle.net/2142/23123"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["\"Extensive computer simulations have been performed to study diffusion processes critical to nucleation and growth of metallic thin films. Diffusion behavior of (1) single adatoms on a flat surface, (2) single adatoms near and at steps on a vicinal surface, and (3) small adatom cluster migration on terraces and (4) single vacancies on a flat surface has been investigated. Many important results have been found. For instance, (i) For adatom diffusion near steps on Ni(111) there exists a \"\"forbidden\"\" region near steps. The adatoms have to overcome a slightly higher energy barrier to get into the \"\"forbidden\"\" region. This is consistent with the latest FIM experiments for Ir adatom diffusion near Ir clusters on Ir(111). (ii) Exchange diffusion at descending steps of type B on Ni(111) was found to be energetically favored and is the dominant mechanism for incorporation of adatoms over descending steps into the step ledges. This is consistent with earlier FIM experiments for W adatom diffusion at Ir cluster steps on Ir(111). (iii) Diffusion of adatoms along the step ledges can be either enhanced, as on Ni(100), or hindered, as on Ni(111). (iv) For the first time an exchange mechanism was found to be favored at descending steps on Ni(110) and (100). (v) The energy barriers for vacancy diffusion on five fcc surfaces were found to be higher than those for single adatom diffusion. (vi) Small clusters migrate in different fashions on different surfaces: on Ni(100) they move through a series of individual jumps of single atoms in the clusters; on Ni(111), for the first time they were found to migrate by concerted jumps of all the atoms in the clusters. The trend in the energy barriers on both surfaces was found to be consistent with available FIM experimental data.\"","Made available in DSpace on 2011-05-07T14:03:00Z (GMT). No. of bitstreams: 2 license.txt: 4922 bytes, checksum: 910b249b4beec47e7ab768910c8f966f (MD5) 9314906.pdf: 5869462 bytes, checksum: 31ddb7b69bc27f4e90523a1af809d4b4 (MD5) Previous issue date: 1993","Item marked as restricted to the 'UIUC Users [automated]' Group (id=2) by Howard Ding (hding2@illinois.edu) on 2011-05-07T15:02:20Z Item is restricted indefinitely.","Restriction data tranferred 2014-07-01T11:29:38-05:00 Original Data Group with Access UIUC Users [automated] Release Date: none Reason: ETDs are only available to UIUC Users without author permission","ETDs are only available to UIUC Users without author permission","U of I Only"]},{"key":"dc:title","label":"Title","values":["Surface diffusion processes critical to metallic film nucleation and growth: An atomic view"]}]}],"canonical_facts":{"dc:contributor":["Adams, James B."],"dc:creator":["Liu, Chun-Li"],"dc:date":["2011-05-07T14:03:00Z","10000-01-01","1993"],"dc:description":["\"Extensive computer simulations have been performed to study diffusion processes critical to nucleation and growth of metallic thin films. Diffusion behavior of (1) single adatoms on a flat surface, (2) single adatoms near and at steps on a vicinal surface, and (3) small adatom cluster migration on terraces and (4) single vacancies on a flat surface has been investigated. Many important results have been found. For instance, (i) For adatom diffusion near steps on Ni(111) there exists a \"\"forbidden\"\" region near steps. The adatoms have to overcome a slightly higher energy barrier to get into the \"\"forbidden\"\" region. This is consistent with the latest FIM experiments for Ir adatom diffusion near Ir clusters on Ir(111). (ii) Exchange diffusion at descending steps of type B on Ni(111) was found to be energetically favored and is the dominant mechanism for incorporation of adatoms over descending steps into the step ledges. This is consistent with earlier FIM experiments for W adatom diffusion at Ir cluster steps on Ir(111). (iii) Diffusion of adatoms along the step ledges can be either enhanced, as on Ni(100), or hindered, as on Ni(111). (iv) For the first time an exchange mechanism was found to be favored at descending steps on Ni(110) and (100). (v) The energy barriers for vacancy diffusion on five fcc surfaces were found to be higher than those for single adatom diffusion. (vi) Small clusters migrate in different fashions on different surfaces: on Ni(100) they move through a series of individual jumps of single atoms in the clusters; on Ni(111), for the first time they were found to migrate by concerted jumps of all the atoms in the clusters. The trend in the energy barriers on both surfaces was found to be consistent with available FIM experimental data.\"","Made available in DSpace on 2011-05-07T14:03:00Z (GMT). No. of bitstreams: 2 license.txt: 4922 bytes, checksum: 910b249b4beec47e7ab768910c8f966f (MD5) 9314906.pdf: 5869462 bytes, checksum: 31ddb7b69bc27f4e90523a1af809d4b4 (MD5) Previous issue date: 1993","Item marked as restricted to the 'UIUC Users [automated]' Group (id=2) by Howard Ding (hding2@illinois.edu) on 2011-05-07T15:02:20Z Item is restricted indefinitely.","Restriction data tranferred 2014-07-01T11:29:38-05:00 Original Data Group with Access UIUC Users [automated] Release Date: none Reason: ETDs are only available to UIUC Users without author permission","ETDs are only available to UIUC Users without author permission","U of I Only"],"dc:identifier":["AAI9314906","(UMI)AAI9314906","http://hdl.handle.net/2142/23123"],"dc:language":["eng"],"dc:rights":["Copyright 1993 Liu, Chun-Li"],"dc:subject":["Engineering, Chemical","Engineering, Metallurgy","Engineering, Materials Science"],"dc:title":["Surface diffusion processes critical to metallic film nucleation and growth: An atomic view"],"dc:type":["text"],"thesis:degree_discipline":["Engineering, Chemical","Engineering, Metallurgy","Engineering, Materials Science"],"thesis:degree_level":["Dissertation"],"thesis:degree_name":["Ph.D."],"thesis:institution_name":["University of Illinois at Urbana-Champaign"]},"updated_at":"2026-07-22T22:25:21Z"}