Photoemission and scanning tunneling microscopy investigation of elemental-semiconductor surfaces
The clean and reacted surfaces of Si(111)-(7x7), Si(100)-(2x1), Ge(111)-c(2x8), and Ge(100)-(2x1) have been studied to better understand the nature of these elemental-semiconductor surfaces. By carefully monitoring the adsorbate-induced changes in the electronic properties at the surface via spectroscopic methods such as photoemission, and by studying the resulting surface structures by scanning tunneling microscopy (STM), a quantitative description of the interaction and reaction between adsorbate and surface can be obtained. The photoemission method allows a distinction between atoms in different layers and in inequivalent sites by their binding energy shifts. By comparison with structural models and reference samples the number of atoms in each distinct chemical configuration can be determined. An adsorbate-induced chemical shift can be correlated with electronegativity differences between substrate and adsorbate atoms. In particular, studies of noble-metal interfaces with the (100) faces of Si and Ge demonstrate this novel combined application of photoemission and STM.
University of Illinois - Urbana-Champaign
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University of Illinois at Urbana-Champaign