Effect of irradiation parameters on the surface pattern evolution in silicon due to ion bombardment
type: CreativeWork
description: Item withdrawn by Mark Zulauf (zulauf@illinois.edu) on 2010-07-21T20:48:21Z Item was in collections: University of Illinois Theses & Dissertations (ID: 1) No. of bitstreams: 2 Das_Kallol.doc: 21661184 bytes, checksum: f2409065741a6879ad0d1ce7b1723624 (MD5) Das_Kallol.pdf: 3864584 bytes, checksum: 5e48ced77ebf2d0162a3bcf56a1849ba (MD5)
abstract: Item withdrawn by Mark Zulauf (zulauf@illinois.edu) on 2010-07-21T20:48:21Z Item was in collections: University of Illinois Theses & Dissertations (ID: 1) No. of bitstreams: 2 Das_Kallol.doc: 21661184 bytes, checksum: f2409065741a6879ad0d1ce7b1723624 (MD5) Das_Kallol.pdf: 3864584 bytes, checksum: 5e48ced77ebf2d0162a3bcf56a1849ba (MD5)
author: Das, Kallol
language: en
keywords: ion bombardment, silicon surface pattern, ion irradiation, surface diffusion, molecular dynamics, ripple patterns, moment, crater function
date published: 2010-08-31T20:29:41Z
date modified: 2026-07-22T22:25:09Z
provider: University of Illinois - Urbana-Champaign
publisher: Networked Digital Library of Theses and Dissertations
type: WebPage
source organization: University of Illinois at Urbana-Champaign

PropertyValue
property ID: Handle
value: http://hdl.handle.net/2142/17024