{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/16481"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/16481","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"Aluminum/aluminum oxide structured microplasma devices: Paschen's Law and applications","abstract":"Aluminum/aluminum oxide microplasma novel devices can be fabricated by sequences of inexpensive wet electrochemical processes and provide an attractive tool to study plasma physics by modifying the device geometry as desired. A wet electrochemical process, used for fabricating microscale cavities and developed at the Laboratory for Optical Physics and Engineering, provides an opportunity to investigate plasma characteristic dimensions decreasing toward ~ 1 μm. In this thesis, basic background of the plasma physics and experimental techniques necessary for fabricating structured Al/Al2O3 devices is presented. In order to better understand and predict device performance as the characteristic dimensions decrease toward ~1 μm, a specific experiment regarding the ignition voltage as a function of various device geometries and gas pressures is performed. The goal of this study is to determine if the fabricated Al/Al2O3 devices obey Paschen’s Law.","abstract_html":"Aluminum/aluminum oxide microplasma novel devices can be fabricated by sequences of inexpensive wet electrochemical processes and provide an attractive tool to study plasma physics by modifying the device geometry as desired. A wet electrochemical process, used for fabricating microscale cavities and developed at the Laboratory for Optical Physics and Engineering, provides an opportunity to investigate plasma characteristic dimensions decreasing toward ~ 1 μm. In this thesis, basic background of the plasma physics and experimental techniques necessary for fabricating structured Al/Al2O3 devices is presented. In order to better understand and predict device performance as the characteristic dimensions decrease toward ~1 μm, a specific experiment regarding the ignition voltage as a function of various device geometries and gas pressures is performed. The goal of this study is to determine if the fabricated Al/Al2O3 devices obey Paschen’s Law.","abstract_has_math":false,"creators":["Yoon, Jekwon"],"institution":"University of Illinois at Urbana-Champaign","degree_name":"M.S.","degree_level":"Thesis","degree_discipline":"Electrical & Computer Engr","degree_department":null,"school":null,"contributors":["Eden, James G."],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2010,"date_issued":"2010-06-22T19:37:23Z","date_published":"2010-06-22T19:37:23Z","updated_at":"2026-07-22T22:25:09Z","subjects":["Paschen's law","Aluminum oxide","microplasma"],"languages":["en"],"rights":["Copyright 2010 Jekwon Yoon"],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":"http://hdl.handle.net/2142/16481","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Eden, James G."]},{"key":"dc:creator","label":"Author","values":["Yoon, Jekwon"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2010-06-22T19:37:23Z","2010-5"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Electrical & Computer Engr"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Thesis"]},{"key":"thesis:degree_name","label":"Degree Name","values":["M.S."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Paschen's law","Aluminum oxide","microplasma"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["en"]},{"key":"dc:rights","label":"Dc Rights","values":["Copyright 2010 Jekwon Yoon"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["http://hdl.handle.net/2142/16481"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["Aluminum/aluminum oxide microplasma novel devices can be fabricated by sequences of inexpensive wet electrochemical processes and provide an attractive tool to study plasma physics by modifying the device geometry as desired. A wet electrochemical process, used for fabricating microscale cavities and developed at the Laboratory for Optical Physics and Engineering, provides an opportunity to investigate plasma characteristic dimensions decreasing toward ~ 1 μm. In this thesis, basic background of the plasma physics and experimental techniques necessary for fabricating structured Al/Al2O3 devices is presented. In order to better understand and predict device performance as the characteristic dimensions decrease toward ~1 μm, a specific experiment regarding the ignition voltage as a function of various device geometries and gas pressures is performed. The goal of this study is to determine if the fabricated Al/Al2O3 devices obey Paschen’s Law.","Item withdrawn by Mark Zulauf (zulauf@illinois.edu) on 2010-02-26T14:41:16Z Item was in collections: University of Illinois Theses & Dissertations (ID: 1) No. of bitstreams: 2 YOON_JEKWON.pdf: 1111941 bytes, checksum: c93cb3abefcb20319da461155cf942ae (MD5) YOON_JEKWON.docx: 2073848 bytes, checksum: 847d1f77759ac672e5cb07df99b27c3f (MD5)","Made available in DSpace on 2010-06-22T19:37:23Z (GMT). No. of bitstreams: 3 YOON_JEKWON.docx: 2073848 bytes, checksum: 847d1f77759ac672e5cb07df99b27c3f (MD5) YOON_JEKWON.pdf: 1111941 bytes, checksum: c93cb3abefcb20319da461155cf942ae (MD5) license.txt: 4059 bytes, checksum: 34304174209ab87f0eea36c954df0f9f (MD5)"]},{"key":"dc:title","label":"Title","values":["Aluminum/aluminum oxide structured microplasma devices: Paschen's Law and applications"]}]}],"canonical_facts":{"dc:contributor":["Eden, James G."],"dc:creator":["Yoon, Jekwon"],"dc:date":["2010-06-22T19:37:23Z","2010-5"],"dc:description":["Aluminum/aluminum oxide microplasma novel devices can be fabricated by sequences of inexpensive wet electrochemical processes and provide an attractive tool to study plasma physics by modifying the device geometry as desired. A wet electrochemical process, used for fabricating microscale cavities and developed at the Laboratory for Optical Physics and Engineering, provides an opportunity to investigate plasma characteristic dimensions decreasing toward ~ 1 μm. In this thesis, basic background of the plasma physics and experimental techniques necessary for fabricating structured Al/Al2O3 devices is presented. In order to better understand and predict device performance as the characteristic dimensions decrease toward ~1 μm, a specific experiment regarding the ignition voltage as a function of various device geometries and gas pressures is performed. The goal of this study is to determine if the fabricated Al/Al2O3 devices obey Paschen’s Law.","Item withdrawn by Mark Zulauf (zulauf@illinois.edu) on 2010-02-26T14:41:16Z Item was in collections: University of Illinois Theses & Dissertations (ID: 1) No. of bitstreams: 2 YOON_JEKWON.pdf: 1111941 bytes, checksum: c93cb3abefcb20319da461155cf942ae (MD5) YOON_JEKWON.docx: 2073848 bytes, checksum: 847d1f77759ac672e5cb07df99b27c3f (MD5)","Made available in DSpace on 2010-06-22T19:37:23Z (GMT). No. of bitstreams: 3 YOON_JEKWON.docx: 2073848 bytes, checksum: 847d1f77759ac672e5cb07df99b27c3f (MD5) YOON_JEKWON.pdf: 1111941 bytes, checksum: c93cb3abefcb20319da461155cf942ae (MD5) license.txt: 4059 bytes, checksum: 34304174209ab87f0eea36c954df0f9f (MD5)"],"dc:identifier":["http://hdl.handle.net/2142/16481"],"dc:language":["en"],"dc:rights":["Copyright 2010 Jekwon Yoon"],"dc:subject":["Paschen's law","Aluminum oxide","microplasma"],"dc:title":["Aluminum/aluminum oxide structured microplasma devices: Paschen's Law and applications"],"thesis:degree_discipline":["Electrical & Computer Engr"],"thesis:degree_level":["Thesis"],"thesis:degree_name":["M.S."],"thesis:institution_name":["University of Illinois at Urbana-Champaign"]},"updated_at":"2026-07-22T22:25:09Z"}