{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/15547"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/15547","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"Soft lithography - materials and applications to plasmonic sensing and surface-enhanced raman scattering","abstract":"Made available in DSpace on 2010-05-14T20:49:43Z (GMT). No. of bitstreams: 2 Truong_Tu.pdf: 43938504 bytes, checksum: a79f2e17b49e8749b1272d63565e91fa (MD5) license.txt: 4059 bytes, checksum: 907fd9f6c2816e57946815d7d73b2f8e (MD5)","abstract_html":"Made available in DSpace on 2010-05-14T20:49:43Z (GMT). No. of bitstreams: 2 Truong_Tu.pdf: 43938504 bytes, checksum: a79f2e17b49e8749b1272d63565e91fa (MD5) license.txt: 4059 bytes, checksum: 907fd9f6c2816e57946815d7d73b2f8e (MD5)","abstract_has_math":false,"creators":["Truong, Tu T."],"institution":"University of Illinois at Urbana-Champaign","degree_name":"Ph.D.","degree_level":"Dissertation","degree_discipline":"Chemistry","degree_department":null,"school":null,"contributors":["Rogers, John A.","Nuzzo, Ralph G.","Kenis, Paul J.A.","Bailey, Ryan C."],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2010,"date_issued":"2010-05-14T20:49:43Z","date_published":"2010-05-14T20:49:43Z","updated_at":"2026-07-22T22:25:08Z","subjects":["plasmonic crystals","Soft lithography","Surface enhanced Raman spectroscopy (SERS)","Raman scattering","polydimethylsiloxane","surface plasmon"],"languages":["en"],"rights":["Copyright 2010 Tu Thanh Truong"],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":"http://hdl.handle.net/2142/15547","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Rogers, John A.","Nuzzo, Ralph G.","Kenis, Paul J.A.","Bailey, Ryan C."]},{"key":"dc:creator","label":"Author","values":["Truong, Tu T."]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2010-05-14T20:49:43Z","2012-05-15T10:00:30Z","2010-5"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Chemistry"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Dissertation"]},{"key":"thesis:degree_name","label":"Degree Name","values":["Ph.D."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["plasmonic crystals","Soft lithography","Surface enhanced Raman spectroscopy (SERS)","Raman scattering","polydimethylsiloxane","surface plasmon"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["en"]},{"key":"dc:rights","label":"Dc Rights","values":["Copyright 2010 Tu Thanh Truong"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["http://hdl.handle.net/2142/15547"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["Made available in DSpace on 2010-05-14T20:49:43Z (GMT). No. of bitstreams: 2 Truong_Tu.pdf: 43938504 bytes, checksum: a79f2e17b49e8749b1272d63565e91fa (MD5) license.txt: 4059 bytes, checksum: 907fd9f6c2816e57946815d7d73b2f8e (MD5)","Item marked as restricted to the 'UIUC Users [automated]' Group (id=2) by William Ingram (wingram2@illinois.edu) on 2010-05-14T20:52:44Z Item is restricted until 2012-05-14T20:52:43Z","Item reinstated by Sarah Shreeves (sshreeve@illinois.edu) on 2012-05-15T10:00:29Z Item was in collections: University of Illinois Dissertations and Theses (ID: 204) Dissertations and Theses - Chemistry (ID: 676) No. of bitstreams: 3 Truong_Tu.pdf.txt: 256997 bytes, checksum: 87283e8dc03bbeeaa100cb34f129e822 (MD5) Truong_Tu.pdf: 43938504 bytes, checksum: a79f2e17b49e8749b1272d63565e91fa (MD5) license.txt: 4059 bytes, checksum: 907fd9f6c2816e57946815d7d73b2f8e (MD5)","Item released from any restrictions by Sarah Shreeves (sshreeve@illinois.edu) on 2012-05-15T10:00:30Z","The interest of unconventional techniques for nanofabrication has grown exponentially in recent years due to demanding equirements in micro/nanoscale structures for photonics, microfluidics, biotechnology, and flexible electronics. Soft lithographic methods use elastomeric stamps, molds and conformable photomasks as patterning elements to provide capabilities that are unavailable with conventional techniques: patterning at molecular scale resolution (~1 nm); ability to form three-dimensional (3D) structure directly, in a single step; experimental simplicity and applicability to large areas. This dissertation explores new materials for the soft molds in order to enhance the resolution and application of soft lithographic methods. A commercially available perfluoropolyethylene (a-PFPE) and a synthesized material based on poly[(3-mercaptopropyl) methylsiloxane] (PMMS) are used in a variety of soft lithographic techniques for high fidelity and high resolution patterning. As an application example, I describe a class of quasi-3D plasmonic crystals for biosensing as well as surface-enhanced Raman scattering, with the connection to theoretical results obtained from rigorous electrodynamics simulations.","Item withdrawn by Mark Zulauf (zulauf@illinois.edu) on 2010-02-01T19:39:33Z Item was in collections: University of Illinois Theses & Dissertations (ID: 1) No. of bitstreams: 1 Truong_Tu.pdf: 43938504 bytes, checksum: a79f2e17b49e8749b1272d63565e91fa (MD5)"]},{"key":"dc:title","label":"Title","values":["Soft lithography - materials and applications to plasmonic sensing and surface-enhanced raman scattering"]}]}],"canonical_facts":{"dc:contributor":["Rogers, John A.","Nuzzo, Ralph G.","Kenis, Paul J.A.","Bailey, Ryan C."],"dc:creator":["Truong, Tu T."],"dc:date":["2010-05-14T20:49:43Z","2012-05-15T10:00:30Z","2010-5"],"dc:description":["Made available in DSpace on 2010-05-14T20:49:43Z (GMT). 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Soft lithographic methods use elastomeric stamps, molds and conformable photomasks as patterning elements to provide capabilities that are unavailable with conventional techniques: patterning at molecular scale resolution (~1 nm); ability to form three-dimensional (3D) structure directly, in a single step; experimental simplicity and applicability to large areas. This dissertation explores new materials for the soft molds in order to enhance the resolution and application of soft lithographic methods. A commercially available perfluoropolyethylene (a-PFPE) and a synthesized material based on poly[(3-mercaptopropyl) methylsiloxane] (PMMS) are used in a variety of soft lithographic techniques for high fidelity and high resolution patterning. As an application example, I describe a class of quasi-3D plasmonic crystals for biosensing as well as surface-enhanced Raman scattering, with the connection to theoretical results obtained from rigorous electrodynamics simulations.","Item withdrawn by Mark Zulauf (zulauf@illinois.edu) on 2010-02-01T19:39:33Z Item was in collections: University of Illinois Theses & Dissertations (ID: 1) No. of bitstreams: 1 Truong_Tu.pdf: 43938504 bytes, checksum: a79f2e17b49e8749b1272d63565e91fa (MD5)"],"dc:identifier":["http://hdl.handle.net/2142/15547"],"dc:language":["en"],"dc:rights":["Copyright 2010 Tu Thanh Truong"],"dc:subject":["plasmonic crystals","Soft lithography","Surface enhanced Raman spectroscopy (SERS)","Raman scattering","polydimethylsiloxane","surface plasmon"],"dc:title":["Soft lithography - materials and applications to plasmonic sensing and surface-enhanced raman scattering"],"thesis:degree_discipline":["Chemistry"],"thesis:degree_level":["Dissertation"],"thesis:degree_name":["Ph.D."],"thesis:institution_name":["University of Illinois at Urbana-Champaign"]},"updated_at":"2026-07-22T22:25:08Z"}