Atmospheric Pressure Chemical Vapor Deposition of Functional Oxide Materials for Crystalline Silicon Solar Cells

Functional oxides are versatile materials that can simultaneously enable efficiency gains and cost reductions in crystalline silicon (c-Si) solar cells. In this work, the deposition of functional oxide materials using atmospheric pressure chemical vapor deposition (APCVD) and the integration of these materials into c-Si solar cells are explored. Specifically, thin oxide films and multi-layer film stacks are utilized for the following purposes: (1) to minimize front surface reflectance without increasing parasitic absorption within the anti-reflection coating(s); (2) to maximize internal back reflectance of rear passivated cells, thereby increasing optical absorption of weakly absorbed long wavelength photons (? > 900 nm); (3) to minimize recombination losses by providing excellent surface passivation; and (4) to improve doping processes during cell manufacturing (e.g., emitter and surface field formation) by functioning as highly controllable dopant sources compatible with in-line diffusion processes. The oxide materials deposited by APCVD include amorphous and polycrystalline titanium oxide, aluminum oxide, boron-doped aluminum oxide, silicon oxide, phosphosilicate glass, and borosilicate glass. The microstructure, optical properties, and electronic properties of these films are characterized for different deposition conditions. Additionally, the impact of these materials on the performance of different types of c-Si solar cells is presented using both simulated and experimental current-voltage curves.

Author dc:creator

• Davis, Kristopher

Contributors dc:contributor

• Schoenfeld, Winston

• Photovoltaics
• solar cells
• atmospheric pressure chemical vapor deposition
• functional oxide materials
• Electromagnetics and Photonics
• Optics

Language dc:language

English

Identifier

CFE0005599

OAI identifier oai:identifier

oai:stars.library.ucf.edu:etd-1068