Analysis and determination of chemical mechanical planarization mechanisms for tungsten and copper
type: CreativeWork
description: No abstract prepared.
abstract: No abstract prepared.
author: Mitchell, Evelynn J. R.
language: en
keywords: semiconductor wafers, silicon surfaces, surface preparation, copper, tungsten
identifier: Mitchell, E. J. R. (2000). Analysis and determination of chemical mechanical planarization mechanisms for tungsten and copper [Master's thesis, Southwest Texas State University].
date published: 2000-08
date modified: 2026-07-27T21:19:08Z
provider: Texas Digital Library
publisher: Networked Digital Library of Theses and Dissertations
type: WebPage
source organization: Texas Digital Library

PropertyValue
property ID: Handle
value: https://hdl.handle.net/10877/15364