Abstract
dc:description.abstractExtensive research has been performed on thin metal films due to their interesting mechanical, electrical and magnetic properties. They can exhibit very high residual, internal stresses arising from the film growth and/or external effects. Apart from direct mechanical consequences, several processes such as grain growth and diffusion can be affected by these stresses and their gradients. As a result, it is of cardinal importance to measure and control the residual stresses in thin films. X-ray diffraction (XRD) is one of the most frequently used approaches for (residual) stress measurement. It is non-destructive, highly accurate (stress (variation) of some MPa can be detected) and the stress states of all crystalline phases in a layered structure can be obtained separately. Moreover, additional microstructural information, as the crystallographic texture, the density of crystalline defects, such as dislocations, and the crystal size can be acquired from the collected XRD data. This thesis is dedicated to the investigation of microstructural changes, residual stresses and interdiffusion in thin films by in-situ XRD. A focal point of interest is methodological aspects of in-situ measurements, which are discussed in detail in Chapter 2 and come to application in the following Chapters 3 and 4.
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Kuru, Yener
- Advisor dc:contributor.advisor
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- Mittemeijer, Eric Jan (Prof. Dr. Ir.)
Rights
dc:rights- Statement dc:rights
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- info:eu-repo/semantics/openAccess
- Language dc:language.iso
- en
Identifiers
dc:identifier.*- Dc Identifier Other
- 283698489
- OAI identifier oai:identifier
- oai:elib.uni-stuttgart.de:11682/927