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San Jose State University

Reticulation-etch resistance of positive photoresist

dc:creator Hsieh, Chang-Lin

thesis:degree_name Master of Science (MS)

Degree

thesis:*

Name thesis:degree_name: Master of Science (MS)

Author and committee

dc:creator, dc:contributor.*

Author dc:creator: Hsieh, Chang-Lin

Identifiers

dc:identifier.*

Identifier: https://scholarworks.sjsu.edu/etd_theses/683
OAI identifier oai:identifier: oai:scholarworks.sjsu.edu:etd_theses-1679

Chain of custody

source

Harvested from: San Jose State University
Base URL: scholarworks.sjsu.edu/do/oai/
Last updated: 2026-07-27
Source record: OAI-PMH GetRecord

related terms

sjsu

citation

Hsieh, Chang-Lin. Reticulation-etch resistance of positive photoresist. https://doi.org/10.31979/etd.7pwr-57sj

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