Back to results

San Jose State University

Reactive ion etching of Si/SiO2 by CHF3/CH4/O2 gas mixture

dc:creator Raghuram, Usha

thesis:degree_name Master of Science (MS)

Degree

thesis:*

Name thesis:degree_name: Master of Science (MS)

Author and committee

dc:creator, dc:contributor.*

Author dc:creator: Raghuram, Usha

Identifiers

dc:identifier.*

Identifier: https://scholarworks.sjsu.edu/etd_theses/575
OAI identifier oai:identifier: oai:scholarworks.sjsu.edu:etd_theses-1571

Chain of custody

source

Harvested from: San Jose State University
Base URL: scholarworks.sjsu.edu/do/oai/
Last updated: 2026-07-27
Source record: OAI-PMH GetRecord

related terms

sjsu

citation

Raghuram, Usha. Reactive ion etching of Si/SiO2 by CHF3/CH4/O2 gas mixture. https://doi.org/10.31979/etd.vg93-34qj

More from San Jose State University