The application and analysis of an antireflection coating on a multilayer resist system to generate a 1.0 µm aluminum line over 0.5 µm SiO2 step

Wu, Chung-Ta

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Rochester Institute of Technology

The application and analysis of an antireflection coating on a multilayer resist system to generate a 1.0 µm aluminum line over 0.5 µm SiO2 step

dc:creator Wu, Chung-Ta

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Level thesis:degree_level: Thesis

Author and committee

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Author dc:creator: Wu, Chung-Ta
Contributors dc:contributor: William Batchelder

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Repository record dc:identifier: https://repository.rit.edu/theses/8353
OAI identifier oai:identifier: oai:repository.rit.edu:theses-9368

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Harvested from: Rochester Institute of Technology
Base URL: repository.rit.edu/do/oai/
Last updated: 2026-07-27
Source record: OAI-PMH GetRecord

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Wu, Chung-Ta. The application and analysis of an antireflection coating on a multilayer resist system to generate a 1.0 µm aluminum line over 0.5 µm SiO2 step. Thesis thesis, https://repository.rit.edu/theses/8353

The application and analysis of an antireflection coating on a multilayer resist system to generate a 1.0 µm aluminum line over 0.5 µm SiO2 step

Degree

Author and committee

Identifiers

Chain of custody

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