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Rochester Institute of Technology

Development of nickel silicide for integrated circuit technology

dc:creator Do, Phu H.

thesis:degree_name Materials Science and Engineering (MS)

Degree

thesis:*

Name thesis:degree_name: Materials Science and Engineering (MS)
Level thesis:degree_level: Thesis

Author and committee

dc:creator, dc:contributor.*

Author dc:creator: Do, Phu H.
Contributors dc:contributor: Sean L. Rommel

Identifiers

dc:identifier.*

Repository record dc:identifier: https://repository.rit.edu/theses/7929
OAI identifier oai:identifier: oai:repository.rit.edu:theses-8934

Chain of custody

source

Harvested from: Rochester Institute of Technology
Base URL: repository.rit.edu/do/oai/
Last updated: 2026-07-27
Source record: OAI-PMH GetRecord

related terms

rit
Thesis

citation

Do, Phu H.. Development of nickel silicide for integrated circuit technology. Thesis thesis, https://repository.rit.edu/theses/7929

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