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Rochester Institute of Technology
Adhesion of copper to Teflon® FEP and PFA surfaces modified by vacuum UV photo-oxidation downstream from Ar microwave plasma
Degree
thesis:*- Name thesis:degree_name
- Materials Science and Engineering (MS)
- Level thesis:degree_level
- Thesis
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Dasilva, Wagner
- Contributors dc:contributor
-
- G. Takacs
Identifiers
dc:identifier.*- Repository record dc:identifier
- https://repository.rit.edu/theses/7531
- OAI identifier oai:identifier
- oai:repository.rit.edu:theses-8536