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Rochester Institute of Technology

An Empirical Approach to the Determination of the Optimum Mask Characteristics Required for Improved Color Reproduction in Direct-Screen Photomechanical Processes

Degree

thesis:*
Name thesis:degree_name
Print Media (MS)
Level thesis:degree_level
Thesis

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Cheng, Ben-shan
Contributors dc:contributor
  • Milton Pearson

Identifiers

dc:identifier.*
Repository record dc:identifier
https://repository.rit.edu/theses/6605
OAI identifier oai:identifier
oai:repository.rit.edu:theses-7610

Chain of custody

source
Harvested from
Rochester Institute of Technology
Base URL
repository.rit.edu/do/oai/
Last updated
2026-07-27
Source record
OAI-PMH GetRecord
related terms
citation

Cheng, Ben-shan. An Empirical Approach to the Determination of the Optimum Mask Characteristics Required for Improved Color Reproduction in Direct-Screen Photomechanical Processes. Thesis thesis, https://repository.rit.edu/theses/6605