Order in Thin Films of Diblock Copolymers by Supramolecular Assembly
type: CreativeWork
description: Thin membranes with dense periodic arrays of nanoscopic voids were fabricated using the principles of supramolecular assembly and self-organization in polymers. Such nanoporous membranes can be used as templates for synthesis and patterning of various organic and inorganic materials. In this thesis 4-vinylpyridine fragments of polystyrene-block-poly(4-vinylpyridine) (PS-PVP) were associated with the molecules of two different low molar mass additives, 2-(4'-hydroxybenzeneazo)benzoic acid (HABA) and 3-n-pentadecyl phenol (PDP), via hydrogen bonds. The choice of an additive and a solvent is a key factor which influences the morphologies of the PS-PVP+HABA associates (supramolecular assemblies) in thin films. The reversible association via hydrogen bonds allows the amphiphilic molecules of PDP to phase segregate on the free air interface. Unlike, the molecules of HABA remain associated within cylindrical and lamellar domains formed by the PVP block. A solvent used for film deposition influences the orientation of PVP+HABA domains with respect to the confining interfaces. The films deposited from 1,4-dioxane &amp;#8211; a good solvent for PS and a bad one for PVP+HABA &amp;#8211; demonstrated the perpendicular orientation of PVP+HABA domains. Meanwhile, the preparation of films from a chloroform solution &amp;#8211; a good solvent for both PS and PVP+HABA &amp;#8211; led to the parallel alignment. The orientation was independent on the film thickness (within the studied range of 20&amp;#8211;100 nm) and insensitive to the chemical nature of a substrate. The orientation of the domains was shown to switch upon exposure to vapors of the above mentioned solvents from the parallel to perpendicular orientation and vice versa. Moreover, the swelling of the films in solvent vapors resulted in the significant improvement of the domain ordering. Extraction of HABA with selective solvent transformed of PVP+HABA domains into channels with reactive PVP chains on the walls. The resul…
abstract: Thin membranes with dense periodic arrays of nanoscopic voids were fabricated using the principles of supramolecular assembly and self-organization in polymers. Such nanoporous membranes can be used as templates for synthesis and patterning of various organic and inorganic materials. In this thesis 4-vinylpyridine fragments of polystyrene-block-poly(4-vinylpyridine) (PS-PVP) were associated with the molecules of two different low molar mass additives, 2-(4'-hydroxybenzeneazo)benzoic acid (HABA) and 3-n-pentadecyl phenol (PDP), via hydrogen bonds. The choice of an additive and a solvent is a key factor which influences the morphologies of the PS-PVP+HABA associates (supramolecular assemblies) in thin films. The reversible association via hydrogen bonds allows the amphiphilic molecules of PDP to phase segregate on the free air interface. Unlike, the molecules of HABA remain associated within cylindrical and lamellar domains formed by the PVP block. A solvent used for film deposition influences the orientation of PVP+HABA domains with respect to the confining interfaces. The films deposited from 1,4-dioxane &amp;#8211; a good solvent for PS and a bad one for PVP+HABA &amp;#8211; demonstrated the perpendicular orientation of PVP+HABA domains. Meanwhile, the preparation of films from a chloroform solution &amp;#8211; a good solvent for both PS and PVP+HABA &amp;#8211; led to the parallel alignment. The orientation was independent on the film thickness (within the studied range of 20&amp;#8211;100 nm) and insensitive to the chemical nature of a substrate. The orientation of the domains was shown to switch upon exposure to vapors of the above mentioned solvents from the parallel to perpendicular orientation and vice versa. Moreover, the swelling of the films in solvent vapors resulted in the significant improvement of the domain ordering. Extraction of HABA with selective solvent transformed of PVP+HABA domains into channels with reactive PVP chains on the walls. The resul…
author: Tokarev, Ihor
keywords: Block-Copolymer, Nanostrukturen, Selbststrukturierung, dünne Schichte, block copolymer, nanostructures, self-assembly, thin films
date published: 2004-06-25
date modified: 2026-07-24T03:58:02Z
provider: QUCOSA
publisher: Networked Digital Library of Theses and Dissertations
type: WebPage
source organization: Technische Universität Dresden