{"id":{"repo_id":"purdue-thes","oai_identifier":"oai:docs.lib.purdue.edu:open_access_dissertations-2431"},"canonical_url":"https://search.dev.ndltd.org/etd/purdue-thes/oai:docs.lib.purdue.edu:open_access_dissertations-2431","repository":{"repo_id":"purdue-thes","name":"Purdue University","base_url":"https://docs.lib.purdue.edu/do/oai/"},"display":{"title":"LASER SHOCK IMPRINTING OF METALLIC NANOSTRUCTURES AND SHOCK PROCESSING OF LOW-DIMENSIONAL MATERIALS","abstract":"Laser shock imprinting (LSI) is proposed and developed as a novel ultrafast room-temperature top-down technique for fabricating and tuning of plasmonic nanostructures, and processing of one-dimensional semiconductor nanowires and two-dimensional crystals. The technique utilizes a shock pressure generated by laser ablation of sacrificial materials. Compared with conventional technologies, LSI features ambient condition, good scalability, low cost and high efficiency.","abstract_html":"Laser shock imprinting (LSI) is proposed and developed as a novel ultrafast room-temperature top-down technique for fabricating and tuning of plasmonic nanostructures, and processing of one-dimensional semiconductor nanowires and two-dimensional crystals. The technique utilizes a shock pressure generated by laser ablation of sacrificial materials. Compared with conventional technologies, LSI features ambient condition, good scalability, low cost and high efficiency.","abstract_has_math":false,"creators":["Hu, Yaowu"],"institution":null,"degree_name":"Doctor of Philosophy (PhD)","degree_level":"Dissertation","degree_discipline":"Industrial Engineering","degree_department":null,"school":null,"contributors":["Gary J. Cheng","Peide Ye","Joseph Irudayaraj","Ramses V Martinez","Yi Xuan"],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2016,"date_issued":"2016-01-01T08:00:00Z","date_published":"2016-01-01T08:00:00Z","updated_at":"2026-07-24T03:54:31Z","subjects":[],"languages":[],"rights":[],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":"https://docs.lib.purdue.edu/open_access_dissertations/1215","outbound_label":"Repository record","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Gary J. Cheng","Peide Ye","Joseph Irudayaraj","Ramses V Martinez","Yi Xuan"]},{"key":"dc:creator","label":"Author","values":["Hu, Yaowu"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"thesis:degree_discipline","label":"Discipline","values":["Industrial Engineering"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Dissertation"]},{"key":"thesis:degree_name","label":"Degree Name","values":["Doctor of Philosophy (PhD)"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["https://docs.lib.purdue.edu/open_access_dissertations/1215"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description.abstract","label":"Abstract","values":["Laser shock imprinting (LSI) is proposed and developed as a novel ultrafast room-temperature top-down technique for fabricating and tuning of plasmonic nanostructures, and processing of one-dimensional semiconductor nanowires and two-dimensional crystals. The technique utilizes a shock pressure generated by laser ablation of sacrificial materials. Compared with conventional technologies, LSI features ambient condition, good scalability, low cost and high efficiency."]},{"key":"dc:title","label":"Title","values":["LASER SHOCK IMPRINTING OF METALLIC NANOSTRUCTURES AND SHOCK PROCESSING OF LOW-DIMENSIONAL MATERIALS"]}]}],"canonical_facts":{"dc:contributor":["Gary J. Cheng","Peide Ye","Joseph Irudayaraj","Ramses V Martinez","Yi Xuan"],"dc:creator":["Hu, Yaowu"],"dc:description.abstract":["Laser shock imprinting (LSI) is proposed and developed as a novel ultrafast room-temperature top-down technique for fabricating and tuning of plasmonic nanostructures, and processing of one-dimensional semiconductor nanowires and two-dimensional crystals. The technique utilizes a shock pressure generated by laser ablation of sacrificial materials. Compared with conventional technologies, LSI features ambient condition, good scalability, low cost and high efficiency."],"dc:identifier":["https://docs.lib.purdue.edu/open_access_dissertations/1215"],"dc:title":["LASER SHOCK IMPRINTING OF METALLIC NANOSTRUCTURES AND SHOCK PROCESSING OF LOW-DIMENSIONAL MATERIALS"],"thesis:degree_discipline":["Industrial Engineering"],"thesis:degree_level":["Dissertation"],"thesis:degree_name":["Doctor of Philosophy (PhD)"]},"updated_at":"2026-07-24T03:54:31Z"}