Ultraviolet light with hydrogen peroxide (UV/H2O2) produces hydroxyl radicals that degrade organic micro-pollutants. However, radicals react non-selectively with natural organic matter (NOM). This research effort quantified the effect of NOM variation on the efficiency of UV/H2O2 contaminant destruction, explored the kinetics of hydroxyl radical/NOM reactions, determined the effect of UV/H2O2 on biofilm formation potential, measured UV/H2O2 impact on trihalomethane (TTHM) and haloacetic acid (HAA5) formation potential, and evaluated UV/H2O2 effects on TTHM speciation after chlorination. Granular activated carbon (GAC) adsorption was investigated to improve process efficiency and reduce by-product formation potential without creating brominated THM problems.
A year-long UV/H2O2 pilot study was conducted to study seasonal variations in NOM and multiple GAC breakthrough conditions. Pilot-scale reactors consistently achieved 80% atrazine degradation, allowing comparison of low pressure (LP) and medium pressure (MP) lamps for contaminant destruction efficiency and unintended by-product formation.
The effect of NOM on UV/H2O2 destruction of atrazine, metolachlor, methyl tert-butyl ether (MTBE), methylisoborneol, ibuprofen, gemfibrozil, and 17α-ethynylestradiol was evaluated. UV absorbance scans demonstrated changes in NOM from UV/H2O2 that increased under certain NOM conditions. As NOM increased, electrical energy per order (EEO) requirements for contaminant destruction increased; requirements increased similarly for all contaminants. UV/H2O2 followed by GAC eliminated the contaminants, throughout the year. LP lamps had lower EEO requirements than MP lamps. UV/H2O2 destruction of MTBE was evaluated with bench-scale experiments using waters with varying NOM. Destruction and EEO values correlated well with specific-ultraviolet absorption for pilot-scale and bench-scale experiments. Changes in the kinetics of NOM/hydroxyl radical reactions were observed with different types of NOM.
Total assimilable organic carbon (AOC) concentration increased through UV/H2O2 by 14 to 33%, more with conventionally treated (CONV) reactor influent than with Post-GAC influent. The AOC concentration increases generated by MP and LP processes were similar. The Spirillum strain AOC increased through UV/H2O2 50 to 65% due to formation of smaller more soluble compounds, e.g., organic acids. Pseudomonas fluorescens strain AOC concentration increased when CONV water served as pilot influent, but not when Post-GAC water was used. GAC effluent streams receiving UV/H2O2 pretreatment produced biofilms with greater heterotrophic plate counts than controls. The GAC effluent stream following the MP reactor produced the most viable biofilm.
Three-day simulated distribution system (SDS) TTHM concentration increased through the UV/H2O2 reactors (20 to 118%). Post-GAC reactor influent produced lower 3-day SDS TTHM concentration than CONV influent after UV/H2O2. Three-day SDS HAA5 concentration increased for CONV UV/H2O2 pilot influent, but not for Post-GAC influent. No difference in 3-day SDS DBP concentrations was observed between LP and MP processes. Brominated THMs are more toxic than chloroform, thus minimizing them is desirable. UV/H2O2 did not shift 3-day SDS THMs towards the brominated species. UV/H2O2 increased the TTHM contribution of 3-day SDS chloroform by 7 to 13%, while 3-day SDS bromoform TTHM contribution decreased by 0.5 to 7%. GAC adsorption after UV/H2O2 insignificantly increased 3-day SDS bromoform concentration from 0.01 to 0.02 μmole/L.
UV/H2O2 can be used with GAC for excellent contaminant removal and minimal adverse effects.
","abstract_html":"<p>Ultraviolet light with hydrogen peroxide (UV/H<sub>2</sub>O<sub>2</sub>) produces hydroxyl radicals that degrade organic micro-pollutants. However, radicals react non-selectively with natural organic matter (NOM). This research effort quantified the effect of NOM variation on the efficiency of UV/H<sub>2</sub>O<sub>2</sub> contaminant destruction, explored the kinetics of hydroxyl radical/NOM reactions, determined the effect of UV/H<sub>2</sub>O<sub>2</sub> on biofilm formation potential, measured UV/H<sub>2</sub>O<sub>2</sub> impact on trihalomethane (TTHM) and haloacetic acid (HAA5) formation potential, and evaluated UV/H<sub>2</sub>O<sub>2</sub> effects on TTHM speciation after chlorination. Granular activated carbon (GAC) adsorption was investigated to improve process efficiency and reduce by-product formation potential without creating brominated THM problems.</p><p>A year-long UV/H<sub>2</sub>O<sub>2</sub> pilot study was conducted to study seasonal variations in NOM and multiple GAC breakthrough conditions. Pilot-scale reactors consistently achieved 80% atrazine degradation, allowing comparison of low pressure (LP) and medium pressure (MP) lamps for contaminant destruction efficiency and unintended by-product formation. </p><p>The effect of NOM on UV/H<sub>2</sub>O<sub>2</sub> destruction of atrazine, metolachlor, methyl tert-butyl ether (MTBE), methylisoborneol, ibuprofen, gemfibrozil, and 17α-ethynylestradiol was evaluated. UV absorbance scans demonstrated changes in NOM from UV/H<sub>2</sub>O<sub>2</sub> that increased under certain NOM conditions. As NOM increased, electrical energy per order (E<sub>EO</sub>) requirements for contaminant destruction increased; requirements increased similarly for all contaminants. UV/H<sub>2</sub>O<sub>2</sub> followed by GAC eliminated the contaminants, throughout the year. LP lamps had lower E<sub>EO</sub> requirements than MP lamps. UV/H<sub>2</sub>O<sub>2</sub> destruction of MTBE was evaluated with bench-scale experiments using waters with varying NOM. Destruction and E<sub>EO</sub> values correlated well with specific-ultraviolet absorption for pilot-scale and bench-scale experiments. Changes in the kinetics of NOM/hydroxyl radical reactions were observed with different types of NOM.</p><p>Total assimilable organic carbon (AOC) concentration increased through UV/H<sub>2</sub>O<sub>2</sub> by 14 to 33%, more with conventionally treated (CONV) reactor influent than with Post-GAC influent. The AOC concentration increases generated by MP and LP processes were similar. The <i>Spirillum</i> strain AOC increased through UV/H<sub>2</sub>O<sub>2</sub> 50 to 65% due to formation of smaller more soluble compounds, e.g., organic acids. <i>Pseudomonas fluorescens</i> strain AOC concentration increased when CONV water served as pilot influent, but not when Post-GAC water was used. GAC effluent streams receiving UV/H<sub>2</sub>O<sub>2</sub> pretreatment produced biofilms with greater heterotrophic plate counts than controls. The GAC effluent stream following the MP reactor produced the most viable biofilm.</p><p>Three-day simulated distribution system (SDS) TTHM concentration increased through the UV/H<sub>2</sub>O<sub>2</sub> reactors (20 to 118%). Post-GAC reactor influent produced lower 3-day SDS TTHM concentration than CONV influent after UV/H<sub>2</sub>O<sub>2</sub>. Three-day SDS HAA5 concentration increased for CONV UV/H<sub>2</sub>O<sub>2</sub> pilot influent, but not for Post-GAC influent. No difference in 3-day SDS DBP concentrations was observed between LP and MP processes. Brominated THMs are more toxic than chloroform, thus minimizing them is desirable. UV/H<sub>2</sub>O<sub>2</sub> did not shift 3-day SDS THMs towards the brominated species. UV/H<sub>2</sub>O<sub>2</sub> increased the TTHM contribution of 3-day SDS chloroform by 7 to 13%, while 3-day SDS bromoform TTHM contribution decreased by 0.5 to 7%. GAC adsorption after UV/H<sub>2</sub>O<sub>2</sub> insignificantly increased 3-day SDS bromoform concentration from 0.01 to 0.02 μmole/L. </p><p>UV/H2O2 can be used with GAC for excellent contaminant removal and minimal adverse effects.</p>","abstract_has_math":false,"creators":["Metz, Deborah H."],"institution":"University of Cincinnati","degree_name":"PhD","degree_level":"doctoral","degree_discipline":"Engineering and Applied Science: Environmental Science","degree_department":null,"school":null,"contributors":["Dionysiou, Dionysios"],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2012,"date_issued":"2012","date_published":"2012","updated_at":"2026-07-24T03:36:23Z","subjects":["Environmental Science","UV H2O2","contaminant destruction","byproduct formation potential","advanced oxidation","biofilm potential","disinfection byproduct formation potential"],"languages":["English"],"rights":["unrestricted","This thesis or dissertation is protected by copyright: all rights reserved. It may not be copied or redistributed beyond the terms of applicable copyright laws."],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":"http://rave.ohiolink.edu/etdc/view?acc_num=ucin1337007191","outbound_label":"Repository record","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Dionysiou, Dionysios"]},{"key":"dc:creator","label":"Author","values":["Metz, Deborah H."]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2012"]},{"key":"dc:publisher","label":"Institution","values":["University of Cincinnati / OhioLINK"]},{"key":"dc:type","label":"Dc Type","values":["Electronic Thesis or Dissertation"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Engineering and Applied Science: Environmental Science"]},{"key":"thesis:degree_level","label":"Degree Level","values":["doctoral"]},{"key":"thesis:degree_name","label":"Degree Name","values":["PhD"]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Cincinnati"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Environmental Science","UV H2O2","contaminant destruction","byproduct formation potential","advanced oxidation","biofilm potential","disinfection byproduct formation potential"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["English"]},{"key":"dc:rights","label":"Dc Rights","values":["unrestricted","This thesis or dissertation is protected by copyright: all rights reserved. It may not be copied or redistributed beyond the terms of applicable copyright laws."]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["http://rave.ohiolink.edu/etdc/view?acc_num=ucin1337007191"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["Ultraviolet light with hydrogen peroxide (UV/H2O2) produces hydroxyl radicals that degrade organic micro-pollutants. However, radicals react non-selectively with natural organic matter (NOM). This research effort quantified the effect of NOM variation on the efficiency of UV/H2O2 contaminant destruction, explored the kinetics of hydroxyl radical/NOM reactions, determined the effect of UV/H2O2 on biofilm formation potential, measured UV/H2O2 impact on trihalomethane (TTHM) and haloacetic acid (HAA5) formation potential, and evaluated UV/H2O2 effects on TTHM speciation after chlorination. Granular activated carbon (GAC) adsorption was investigated to improve process efficiency and reduce by-product formation potential without creating brominated THM problems.
A year-long UV/H2O2 pilot study was conducted to study seasonal variations in NOM and multiple GAC breakthrough conditions. Pilot-scale reactors consistently achieved 80% atrazine degradation, allowing comparison of low pressure (LP) and medium pressure (MP) lamps for contaminant destruction efficiency and unintended by-product formation.
The effect of NOM on UV/H2O2 destruction of atrazine, metolachlor, methyl tert-butyl ether (MTBE), methylisoborneol, ibuprofen, gemfibrozil, and 17α-ethynylestradiol was evaluated. UV absorbance scans demonstrated changes in NOM from UV/H2O2 that increased under certain NOM conditions. As NOM increased, electrical energy per order (EEO) requirements for contaminant destruction increased; requirements increased similarly for all contaminants. UV/H2O2 followed by GAC eliminated the contaminants, throughout the year. LP lamps had lower EEO requirements than MP lamps. UV/H2O2 destruction of MTBE was evaluated with bench-scale experiments using waters with varying NOM. Destruction and EEO values correlated well with specific-ultraviolet absorption for pilot-scale and bench-scale experiments. Changes in the kinetics of NOM/hydroxyl radical reactions were observed with different types of NOM.
Total assimilable organic carbon (AOC) concentration increased through UV/H2O2 by 14 to 33%, more with conventionally treated (CONV) reactor influent than with Post-GAC influent. The AOC concentration increases generated by MP and LP processes were similar. The Spirillum strain AOC increased through UV/H2O2 50 to 65% due to formation of smaller more soluble compounds, e.g., organic acids. Pseudomonas fluorescens strain AOC concentration increased when CONV water served as pilot influent, but not when Post-GAC water was used. GAC effluent streams receiving UV/H2O2 pretreatment produced biofilms with greater heterotrophic plate counts than controls. The GAC effluent stream following the MP reactor produced the most viable biofilm.
Three-day simulated distribution system (SDS) TTHM concentration increased through the UV/H2O2 reactors (20 to 118%). Post-GAC reactor influent produced lower 3-day SDS TTHM concentration than CONV influent after UV/H2O2. Three-day SDS HAA5 concentration increased for CONV UV/H2O2 pilot influent, but not for Post-GAC influent. No difference in 3-day SDS DBP concentrations was observed between LP and MP processes. Brominated THMs are more toxic than chloroform, thus minimizing them is desirable. UV/H2O2 did not shift 3-day SDS THMs towards the brominated species. UV/H2O2 increased the TTHM contribution of 3-day SDS chloroform by 7 to 13%, while 3-day SDS bromoform TTHM contribution decreased by 0.5 to 7%. GAC adsorption after UV/H2O2 insignificantly increased 3-day SDS bromoform concentration from 0.01 to 0.02 μmole/L.
UV/H2O2 can be used with GAC for excellent contaminant removal and minimal adverse effects.
"]},{"key":"dc:format","label":"Dc Format","values":["application/pdf","p.277","2.38 MB"]},{"key":"dc:title","label":"Title","values":["The Effect of Natural Organic Matter on UV/H2O2 Treatment and the Effect of UV/H2O2 Treatment on Natural Organic Matter"]}]}],"canonical_facts":{"dc:contributor":["Dionysiou, Dionysios"],"dc:creator":["Metz, Deborah H."],"dc:date":["2012"],"dc:description":["Ultraviolet light with hydrogen peroxide (UV/H2O2) produces hydroxyl radicals that degrade organic micro-pollutants. However, radicals react non-selectively with natural organic matter (NOM). This research effort quantified the effect of NOM variation on the efficiency of UV/H2O2 contaminant destruction, explored the kinetics of hydroxyl radical/NOM reactions, determined the effect of UV/H2O2 on biofilm formation potential, measured UV/H2O2 impact on trihalomethane (TTHM) and haloacetic acid (HAA5) formation potential, and evaluated UV/H2O2 effects on TTHM speciation after chlorination. Granular activated carbon (GAC) adsorption was investigated to improve process efficiency and reduce by-product formation potential without creating brominated THM problems.
A year-long UV/H2O2 pilot study was conducted to study seasonal variations in NOM and multiple GAC breakthrough conditions. Pilot-scale reactors consistently achieved 80% atrazine degradation, allowing comparison of low pressure (LP) and medium pressure (MP) lamps for contaminant destruction efficiency and unintended by-product formation.
The effect of NOM on UV/H2O2 destruction of atrazine, metolachlor, methyl tert-butyl ether (MTBE), methylisoborneol, ibuprofen, gemfibrozil, and 17α-ethynylestradiol was evaluated. UV absorbance scans demonstrated changes in NOM from UV/H2O2 that increased under certain NOM conditions. As NOM increased, electrical energy per order (EEO) requirements for contaminant destruction increased; requirements increased similarly for all contaminants. UV/H2O2 followed by GAC eliminated the contaminants, throughout the year. LP lamps had lower EEO requirements than MP lamps. UV/H2O2 destruction of MTBE was evaluated with bench-scale experiments using waters with varying NOM. Destruction and EEO values correlated well with specific-ultraviolet absorption for pilot-scale and bench-scale experiments. Changes in the kinetics of NOM/hydroxyl radical reactions were observed with different types of NOM.
Total assimilable organic carbon (AOC) concentration increased through UV/H2O2 by 14 to 33%, more with conventionally treated (CONV) reactor influent than with Post-GAC influent. The AOC concentration increases generated by MP and LP processes were similar. The Spirillum strain AOC increased through UV/H2O2 50 to 65% due to formation of smaller more soluble compounds, e.g., organic acids. Pseudomonas fluorescens strain AOC concentration increased when CONV water served as pilot influent, but not when Post-GAC water was used. GAC effluent streams receiving UV/H2O2 pretreatment produced biofilms with greater heterotrophic plate counts than controls. The GAC effluent stream following the MP reactor produced the most viable biofilm.
Three-day simulated distribution system (SDS) TTHM concentration increased through the UV/H2O2 reactors (20 to 118%). Post-GAC reactor influent produced lower 3-day SDS TTHM concentration than CONV influent after UV/H2O2. Three-day SDS HAA5 concentration increased for CONV UV/H2O2 pilot influent, but not for Post-GAC influent. No difference in 3-day SDS DBP concentrations was observed between LP and MP processes. Brominated THMs are more toxic than chloroform, thus minimizing them is desirable. UV/H2O2 did not shift 3-day SDS THMs towards the brominated species. UV/H2O2 increased the TTHM contribution of 3-day SDS chloroform by 7 to 13%, while 3-day SDS bromoform TTHM contribution decreased by 0.5 to 7%. GAC adsorption after UV/H2O2 insignificantly increased 3-day SDS bromoform concentration from 0.01 to 0.02 μmole/L.
UV/H2O2 can be used with GAC for excellent contaminant removal and minimal adverse effects.
"],"dc:format":["application/pdf","p.277","2.38 MB"],"dc:identifier":["http://rave.ohiolink.edu/etdc/view?acc_num=ucin1337007191"],"dc:language":["English"],"dc:publisher":["University of Cincinnati / OhioLINK"],"dc:rights":["unrestricted","This thesis or dissertation is protected by copyright: all rights reserved. It may not be copied or redistributed beyond the terms of applicable copyright laws."],"dc:subject":["Environmental Science","UV H2O2","contaminant destruction","byproduct formation potential","advanced oxidation","biofilm potential","disinfection byproduct formation potential"],"dc:title":["The Effect of Natural Organic Matter on UV/H2O2 Treatment and the Effect of UV/H2O2 Treatment on Natural Organic Matter"],"dc:type":["Electronic Thesis or Dissertation"],"thesis:degree_discipline":["Engineering and Applied Science: Environmental Science"],"thesis:degree_level":["doctoral"],"thesis:degree_name":["PhD"],"thesis:institution_name":["University of Cincinnati"]},"updated_at":"2026-07-24T03:36:23Z"}