{"id":{"repo_id":"odu","oai_identifier":"oai:digitalcommons.odu.edu:physics_etds-1068"},"canonical_url":"https://search.dev.ndltd.org/etd/odu/oai:digitalcommons.odu.edu:physics_etds-1068","repository":{"repo_id":"odu","name":"Old Dominion University","base_url":"https://digitalcommons.odu.edu/do/oai/"},"display":{"title":"Characterization of Microwave Discharge Plasmas for Surface Processing","abstract":"<p>We have developed several diagnostic techniques to characterize two types of microwave (MW) discharge plasmas: a supersonic flowing argon MW discharge maintained in a cylindrical quartz cavity at frequency ƒ = 2.45 GHz and a pulse repetitive MW discharge in air at ƒ = 9.5 GHz. Low temperature MW discharges have been proven to posses attractive properties for plasma cleaning and etching of niobium surfaces of superconductive radio frequency (SRF) cavities. Plasma based surface modification technologies offer a promising alternative for etching and cleaning of SRF cavities. These technologies are low cost, environmentally friendly and easily controllable, and present a possible alternative to currently used acid based wet technologies, such as buffered chemical polishing (BCP), or electrochemical polishing (EP). In fact, weakly ionized. non-equilibrium, and low temperature gas discharges represent a powerful tool for surface processing due to the strong chemical reactivity of plasma radicals. Therefore, characterizing these discharges by applying non-perturbing, <em>in situ </em>measurement techniques is of vital importance.</p>","abstract_html":"&lt;p&gt;We have developed several diagnostic techniques to characterize two types of microwave (MW) discharge plasmas: a supersonic flowing argon MW discharge maintained in a cylindrical quartz cavity at frequency ƒ = 2.45 GHz and a pulse repetitive MW discharge in air at ƒ = 9.5 GHz. Low temperature MW discharges have been proven to posses attractive properties for plasma cleaning and etching of niobium surfaces of superconductive radio frequency (SRF) cavities. Plasma based surface modification technologies offer a promising alternative for etching and cleaning of SRF cavities. These technologies are low cost, environmentally friendly and easily controllable, and present a possible alternative to currently used acid based wet technologies, such as buffered chemical polishing (BCP), or electrochemical polishing (EP). In fact, weakly ionized. non-equilibrium, and low temperature gas discharges represent a powerful tool for surface processing due to the strong chemical reactivity of plasma radicals. Therefore, characterizing these discharges by applying non-perturbing, &lt;em&gt;in situ &lt;/em&gt;measurement techniques is of vital importance.&lt;/p&gt;","abstract_has_math":false,"creators":["Nikolic, Milka"],"institution":null,"degree_name":"Doctor of Philosophy (PhD)","degree_level":"Dissertation","degree_discipline":"Physics","degree_department":null,"school":null,"contributors":["Leposava Vuskovic","Charles I. Sukenik","Gail Dodge","Alexander Godunov","Mileta Tomovic"],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2013,"date_issued":"2013-07-01T07:00:00Z","date_published":"2013-07-01T07:00:00Z","updated_at":"2026-07-24T03:34:18Z","subjects":["Electron density","Excited argon","Microwave discharge plasmas","Superconductive radio frequency","Plasma and Beam Physics"],"languages":[],"rights":["<p>In Copyright. URI: <a href=\"http://rightsstatements.org/vocab/InC/1.0/\">http://rightsstatements.org/vocab/InC/1.0/</a> This Item is protected by copyright and/or related rights. You are free to use this Item in any way that is permitted by the copyright and related rights legislation that applies to your use. For other uses you need to obtain permission from the rights-holder(s).</p>"],"rights_urls":[],"identifier_entries":[{"key":"dc:identifier","label":"Identifier","values":["9781303528897"],"render_values":[{"text":"9781303528897","href":null,"code":true}]}]},"links":{"outbound_url":"https://digitalcommons.odu.edu/physics_etds/69","outbound_label":"Repository record","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Leposava Vuskovic","Charles I. 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URI: <a href=\"http://rightsstatements.org/vocab/InC/1.0/\">http://rightsstatements.org/vocab/InC/1.0/</a> This Item is protected by copyright and/or related rights. You are free to use this Item in any way that is permitted by the copyright and related rights legislation that applies to your use. For other uses you need to obtain permission from the rights-holder(s).</p>"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["9781303528897","https://digitalcommons.odu.edu/physics_etds/69"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description.abstract","label":"Abstract","values":["<p>We have developed several diagnostic techniques to characterize two types of microwave (MW) discharge plasmas: a supersonic flowing argon MW discharge maintained in a cylindrical quartz cavity at frequency ƒ = 2.45 GHz and a pulse repetitive MW discharge in air at ƒ = 9.5 GHz. Low temperature MW discharges have been proven to posses attractive properties for plasma cleaning and etching of niobium surfaces of superconductive radio frequency (SRF) cavities. Plasma based surface modification technologies offer a promising alternative for etching and cleaning of SRF cavities. These technologies are low cost, environmentally friendly and easily controllable, and present a possible alternative to currently used acid based wet technologies, such as buffered chemical polishing (BCP), or electrochemical polishing (EP). In fact, weakly ionized. non-equilibrium, and low temperature gas discharges represent a powerful tool for surface processing due to the strong chemical reactivity of plasma radicals. Therefore, characterizing these discharges by applying non-perturbing, <em>in situ </em>measurement techniques is of vital importance.</p>"]},{"key":"dc:title","label":"Title","values":["Characterization of Microwave Discharge Plasmas for Surface Processing"]}]}],"canonical_facts":{"dc:contributor":["Leposava Vuskovic","Charles I. Sukenik","Gail Dodge","Alexander Godunov","Mileta Tomovic"],"dc:creator":["Nikolic, Milka"],"dc:date.available":["2019-02-21T08:00:00Z"],"dc:description.abstract":["<p>We have developed several diagnostic techniques to characterize two types of microwave (MW) discharge plasmas: a supersonic flowing argon MW discharge maintained in a cylindrical quartz cavity at frequency ƒ = 2.45 GHz and a pulse repetitive MW discharge in air at ƒ = 9.5 GHz. Low temperature MW discharges have been proven to posses attractive properties for plasma cleaning and etching of niobium surfaces of superconductive radio frequency (SRF) cavities. Plasma based surface modification technologies offer a promising alternative for etching and cleaning of SRF cavities. These technologies are low cost, environmentally friendly and easily controllable, and present a possible alternative to currently used acid based wet technologies, such as buffered chemical polishing (BCP), or electrochemical polishing (EP). In fact, weakly ionized. non-equilibrium, and low temperature gas discharges represent a powerful tool for surface processing due to the strong chemical reactivity of plasma radicals. Therefore, characterizing these discharges by applying non-perturbing, <em>in situ </em>measurement techniques is of vital importance.</p>"],"dc:identifier":["9781303528897","https://digitalcommons.odu.edu/physics_etds/69"],"dc:rights":["<p>In Copyright. URI: <a href=\"http://rightsstatements.org/vocab/InC/1.0/\">http://rightsstatements.org/vocab/InC/1.0/</a> This Item is protected by copyright and/or related rights. You are free to use this Item in any way that is permitted by the copyright and related rights legislation that applies to your use. For other uses you need to obtain permission from the rights-holder(s).</p>"],"dc:subject":["Electron density","Excited argon","Microwave discharge plasmas","Superconductive radio frequency","Plasma and Beam Physics"],"dc:title":["Characterization of Microwave Discharge Plasmas for Surface Processing"],"thesis:degree_discipline":["Physics"],"thesis:degree_level":["Dissertation"],"thesis:degree_name":["Doctor of Philosophy (PhD)"]},"updated_at":"2026-07-24T03:34:18Z"}