{"id":{"repo_id":"njit","oai_identifier":"oai:digitalcommons.njit.edu:theses-1536"},"canonical_url":"https://search.dev.ndltd.org/etd/njit/oai:digitalcommons.njit.edu:theses-1536","repository":{"repo_id":"njit","name":"NJIT","base_url":"https://digitalcommons.njit.edu/do/oai/"},"display":{"title":"Chemical vapor deposition of polymeric films","abstract":"Poly-peri-naphthalene (PPN) is a one-dimensional (1 -D) graphite polymer with unique planar ladder-like conjugated molecular structure. PPN was predicted to be a good intrinsic conductor and have high thermal stability and high environmental stability. In this project, chemical vapor deposition (CVD) and plasma enhanced chemical vapor deposition (PECVD) of carbon films with PPN structure using PTCDA as precursor were carried out under different conditions. There is only limited information in literature on the synthesis of PPN films by PECVD process, which may allow deposition at a higher rate with lower substrate temperature. In this work the influence of deposition parameters, such as sublimation temperature, substrate (pyrolysis) temperature, pressure, plasma condition on the structure of deposition product was systematically studied. It's found that the following deposition parameters are required for carbon films containing PPN structure: CVD: sublimation temperature 510 C for PTCDA and substrate temperature around 380 C in atmosphere pressure. This confirms the results of previous studies of this material. PECVD: sublimation temperature and substrate temperature both approximate 350 C, with DC discharge power of several watts, stable plasma in argon gas of approximate 1 torr pressure. In the synthesis of PPN films by both methods, substrate temperature plays an important role that affects quality of the films.","abstract_html":"Poly-peri-naphthalene (PPN) is a one-dimensional (1 -D) graphite polymer with unique planar ladder-like conjugated molecular structure. PPN was predicted to be a good intrinsic conductor and have high thermal stability and high environmental stability. In this project, chemical vapor deposition (CVD) and plasma enhanced chemical vapor deposition (PECVD) of carbon films with PPN structure using PTCDA as precursor were carried out under different conditions. There is only limited information in literature on the synthesis of PPN films by PECVD process, which may allow deposition at a higher rate with lower substrate temperature. In this work the influence of deposition parameters, such as sublimation temperature, substrate (pyrolysis) temperature, pressure, plasma condition on the structure of deposition product was systematically studied. It's found that the following deposition parameters are required for carbon films containing PPN structure: CVD: sublimation temperature 510 C for PTCDA and substrate temperature around 380 C in atmosphere pressure. This confirms the results of previous studies of this material. PECVD: sublimation temperature and substrate temperature both approximate 350 C, with DC discharge power of several watts, stable plasma in argon gas of approximate 1 torr pressure. In the synthesis of PPN films by both methods, substrate temperature plays an important role that affects quality of the films.","abstract_has_math":false,"creators":["Yu, Chi"],"institution":null,"degree_name":"Master of Science in Materials Science and Engineering - (M.S.)","degree_level":null,"degree_discipline":"Committee for the Interdisciplinary Program in Materials Science and Engineering","degree_department":null,"school":null,"contributors":["Marek Sosnowski","Haim Grebel","Zafar Iqbal"],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2004,"date_issued":"2004-01-31T08:00:00Z","date_published":"2004-01-31T08:00:00Z","updated_at":"2026-07-24T03:23:27Z","subjects":["Chemical vapor deposition","Plasma enhanced chemical vapor deposition","Carbon films","Materials Science and Engineering"],"languages":[],"rights":[],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":"https://digitalcommons.njit.edu/theses/537","outbound_label":"Repository record","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Marek Sosnowski","Haim Grebel","Zafar Iqbal"]},{"key":"dc:creator","label":"Author","values":["Yu, Chi"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:type","label":"Dc Type","values":["Thesis"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Committee for the Interdisciplinary Program in Materials Science and Engineering"]},{"key":"thesis:degree_name","label":"Degree Name","values":["Master of Science in Materials Science and Engineering - (M.S.)"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Chemical vapor deposition","Plasma enhanced chemical vapor deposition","Carbon films","Materials Science and Engineering"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["https://digitalcommons.njit.edu/theses/537"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description.abstract","label":"Abstract","values":["Poly-peri-naphthalene (PPN) is a one-dimensional (1 -D) graphite polymer with unique planar ladder-like conjugated molecular structure. PPN was predicted to be a good intrinsic conductor and have high thermal stability and high environmental stability. In this project, chemical vapor deposition (CVD) and plasma enhanced chemical vapor deposition (PECVD) of carbon films with PPN structure using PTCDA as precursor were carried out under different conditions. There is only limited information in literature on the synthesis of PPN films by PECVD process, which may allow deposition at a higher rate with lower substrate temperature. In this work the influence of deposition parameters, such as sublimation temperature, substrate (pyrolysis) temperature, pressure, plasma condition on the structure of deposition product was systematically studied. It's found that the following deposition parameters are required for carbon films containing PPN structure: CVD: sublimation temperature 510 C for PTCDA and substrate temperature around 380 C in atmosphere pressure. This confirms the results of previous studies of this material. PECVD: sublimation temperature and substrate temperature both approximate 350 C, with DC discharge power of several watts, stable plasma in argon gas of approximate 1 torr pressure. In the synthesis of PPN films by both methods, substrate temperature plays an important role that affects quality of the films."]},{"key":"dc:title","label":"Title","values":["Chemical vapor deposition of polymeric films"]}]}],"canonical_facts":{"dc:contributor":["Marek Sosnowski","Haim Grebel","Zafar Iqbal"],"dc:creator":["Yu, Chi"],"dc:description.abstract":["Poly-peri-naphthalene (PPN) is a one-dimensional (1 -D) graphite polymer with unique planar ladder-like conjugated molecular structure. PPN was predicted to be a good intrinsic conductor and have high thermal stability and high environmental stability. In this project, chemical vapor deposition (CVD) and plasma enhanced chemical vapor deposition (PECVD) of carbon films with PPN structure using PTCDA as precursor were carried out under different conditions. There is only limited information in literature on the synthesis of PPN films by PECVD process, which may allow deposition at a higher rate with lower substrate temperature. In this work the influence of deposition parameters, such as sublimation temperature, substrate (pyrolysis) temperature, pressure, plasma condition on the structure of deposition product was systematically studied. It's found that the following deposition parameters are required for carbon films containing PPN structure: CVD: sublimation temperature 510 C for PTCDA and substrate temperature around 380 C in atmosphere pressure. This confirms the results of previous studies of this material. PECVD: sublimation temperature and substrate temperature both approximate 350 C, with DC discharge power of several watts, stable plasma in argon gas of approximate 1 torr pressure. In the synthesis of PPN films by both methods, substrate temperature plays an important role that affects quality of the films."],"dc:identifier":["https://digitalcommons.njit.edu/theses/537"],"dc:subject":["Chemical vapor deposition","Plasma enhanced chemical vapor deposition","Carbon films","Materials Science and Engineering"],"dc:title":["Chemical vapor deposition of polymeric films"],"dc:type":["Thesis"],"thesis:degree_discipline":["Committee for the Interdisciplinary Program in Materials Science and Engineering"],"thesis:degree_name":["Master of Science in Materials Science and Engineering - (M.S.)"]},"updated_at":"2026-07-24T03:23:27Z"}