{"id":{"repo_id":"must-thes","oai_identifier":"oai:scholarsmine.mst.edu:doctoral_dissertations-1499"},"canonical_url":"https://search.dev.ndltd.org/etd/must-thes/oai:scholarsmine.mst.edu:doctoral_dissertations-1499","repository":{"repo_id":"must-thes","name":"Missouri University of Science and Technology","base_url":"https://scholarsmine.mst.edu/do/oai/"},"display":{"title":"Chemical corrosion of Ag films on glass","abstract":"<p>\"The chemical corrosion of chemically, vacuum and sputter deposited Ag films on an aluminoborosilicate and a soda lime glass was investigated in wet HCl and saturated water vapor as a function of concentration, temperature and time. The higher corrosion resistance of chemically deposited Ag films in comparison to evaporated or sputtered Ag films is attributed to their lower microvoid density and higher adhesion strength. Ag films on the more chemically durable aluminoborosilicate glass had a higher corrosion resistance. Furthermore, films which received a moderate thermal annealing (80 to 140° C) or were deposited on a glass surface washed with HN0<sub>3</sub> acid or covered with Ni had improved chemical durability. Chemical reactions during exposure occurred at the air/metal surface and the Ag-glass interface. In most cases, the greatest corrosion occurred locally at the unprotected edge, which may be due to the easy penetration of the corrosive media. The reaction products formed in wet HCl vapor are AgCl, NiC1<sub>2</sub>, CuCl and Cu<sub>2</sub>O, while those in saturated water vapor were Ag<sub>2</sub>O, NiO, Cu<sub>2</sub>O and oxalates. The corrosion of open Ag films in saturated water vapor was due to Ag-agglomeration, Ag-alkali interdiffusion and glass hydration\"--Abstract, p. iii</p>","abstract_html":"&lt;p&gt;&quot;The chemical corrosion of chemically, vacuum and sputter deposited Ag films on an aluminoborosilicate and a soda lime glass was investigated in wet HCl and saturated water vapor as a function of concentration, temperature and time. The higher corrosion resistance of chemically deposited Ag films in comparison to evaporated or sputtered Ag films is attributed to their lower microvoid density and higher adhesion strength. Ag films on the more chemically durable aluminoborosilicate glass had a higher corrosion resistance. Furthermore, films which received a moderate thermal annealing (80 to 140° C) or were deposited on a glass surface washed with HN0&lt;sub&gt;3&lt;/sub&gt; acid or covered with Ni had improved chemical durability. Chemical reactions during exposure occurred at the air/metal surface and the Ag-glass interface. In most cases, the greatest corrosion occurred locally at the unprotected edge, which may be due to the easy penetration of the corrosive media. The reaction products formed in wet HCl vapor are AgCl, NiC1&lt;sub&gt;2&lt;/sub&gt;, CuCl and Cu&lt;sub&gt;2&lt;/sub&gt;O, while those in saturated water vapor were Ag&lt;sub&gt;2&lt;/sub&gt;O, NiO, Cu&lt;sub&gt;2&lt;/sub&gt;O and oxalates. The corrosion of open Ag films in saturated water vapor was due to Ag-agglomeration, Ag-alkali interdiffusion and glass hydration&quot;--Abstract, p. iii&lt;/p&gt;","abstract_has_math":false,"creators":["Park, Hyun Soo"],"institution":"University of Missouri--Rolla","degree_name":"Ph. D. in Ceramic Engineering","degree_level":null,"degree_discipline":null,"degree_department":null,"school":null,"contributors":[],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2016,"date_issued":"2016-02-10T08:00:00Z","date_published":"2016-02-10T08:00:00Z","updated_at":"2026-07-24T03:18:09Z","subjects":["Ceramic Materials"],"languages":[],"rights":[],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":"https://scholarsmine.mst.edu/doctoral_dissertations/497","outbound_label":"Repository record","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:creator","label":"Author","values":["Park, Hyun Soo"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date.available","label":"Dc Date Available","values":["2016-02-10T08:00:00Z"]},{"key":"dc:type","label":"Dc Type","values":["Dissertation - Open Access"]},{"key":"thesis:degree_name","label":"Degree Name","values":["Ph. D. in Ceramic Engineering"]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Missouri--Rolla"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Ceramic Materials"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["https://scholarsmine.mst.edu/doctoral_dissertations/497"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description.abstract","label":"Abstract","values":["<p>\"The chemical corrosion of chemically, vacuum and sputter deposited Ag films on an aluminoborosilicate and a soda lime glass was investigated in wet HCl and saturated water vapor as a function of concentration, temperature and time. The higher corrosion resistance of chemically deposited Ag films in comparison to evaporated or sputtered Ag films is attributed to their lower microvoid density and higher adhesion strength. Ag films on the more chemically durable aluminoborosilicate glass had a higher corrosion resistance. Furthermore, films which received a moderate thermal annealing (80 to 140° C) or were deposited on a glass surface washed with HN0<sub>3</sub> acid or covered with Ni had improved chemical durability. Chemical reactions during exposure occurred at the air/metal surface and the Ag-glass interface. In most cases, the greatest corrosion occurred locally at the unprotected edge, which may be due to the easy penetration of the corrosive media. The reaction products formed in wet HCl vapor are AgCl, NiC1<sub>2</sub>, CuCl and Cu<sub>2</sub>O, while those in saturated water vapor were Ag<sub>2</sub>O, NiO, Cu<sub>2</sub>O and oxalates. The corrosion of open Ag films in saturated water vapor was due to Ag-agglomeration, Ag-alkali interdiffusion and glass hydration\"--Abstract, p. iii</p>"]},{"key":"dc:title","label":"Title","values":["Chemical corrosion of Ag films on glass"]}]}],"canonical_facts":{"dc:creator":["Park, Hyun Soo"],"dc:date.available":["2016-02-10T08:00:00Z"],"dc:description.abstract":["<p>\"The chemical corrosion of chemically, vacuum and sputter deposited Ag films on an aluminoborosilicate and a soda lime glass was investigated in wet HCl and saturated water vapor as a function of concentration, temperature and time. The higher corrosion resistance of chemically deposited Ag films in comparison to evaporated or sputtered Ag films is attributed to their lower microvoid density and higher adhesion strength. Ag films on the more chemically durable aluminoborosilicate glass had a higher corrosion resistance. Furthermore, films which received a moderate thermal annealing (80 to 140° C) or were deposited on a glass surface washed with HN0<sub>3</sub> acid or covered with Ni had improved chemical durability. Chemical reactions during exposure occurred at the air/metal surface and the Ag-glass interface. In most cases, the greatest corrosion occurred locally at the unprotected edge, which may be due to the easy penetration of the corrosive media. The reaction products formed in wet HCl vapor are AgCl, NiC1<sub>2</sub>, CuCl and Cu<sub>2</sub>O, while those in saturated water vapor were Ag<sub>2</sub>O, NiO, Cu<sub>2</sub>O and oxalates. The corrosion of open Ag films in saturated water vapor was due to Ag-agglomeration, Ag-alkali interdiffusion and glass hydration\"--Abstract, p. iii</p>"],"dc:identifier":["https://scholarsmine.mst.edu/doctoral_dissertations/497"],"dc:subject":["Ceramic Materials"],"dc:title":["Chemical corrosion of Ag films on glass"],"dc:type":["Dissertation - Open Access"],"thesis:degree_name":["Ph. D. in Ceramic Engineering"],"thesis:institution_name":["University of Missouri--Rolla"]},"updated_at":"2026-07-24T03:18:09Z"}