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Missouri State University

An Investigation of the Surface Properties of Sic For the Growth of Gan Thin Films and Epilayers

Abstract

dc:description.abstract

6H-SiC is currently the best subtrate used in the growth of III-V quantum heterostructures due to a negligible lattice mismatch (~3.5%) between the substrate and the epilayer, compared to sapphire (14%). Considerable amount of research is currently being done all over the world on these III-V compounds, particularly the GaN based compounds, due to their characteristic absorption in the blue region of the electromagnetic spectrum. However, the success of achieving high quality thin films that would produce the needed quantum effect depends not only on the growth parmeters but also on the preparation of the surface of the SiC substrate. The project aimed to determine the most efficient method in the preparation of the substrate. Surface analysis of the SiC using Auger Electron Spectroscopy (AES) and X-ray Photoelectron Spectroscopy (XPS) showed that thermal annealing of the SiC substrate induces graphitization at temperatures as low as 840 °C, but surface oxides are removed only at 940 °C. UHV Si-beam etching was proposed as a cleaning method that would effectively clean the surface of oxides/carbon contaminants at low temperatures without the onset of graphitization. A UHV Si-beam etching apparatus, with a newly purchased evaporator used as the Si source, was built from concept, was designed and was successfully fabricated in-house. Assembly and test of the apparatus showed that it is capable of cleaning the substrate through resistive heating. Due to uncontrollable events, further experiments for its successful operation were recommended.

Degree

thesis:*
Name thesis:degree_name
Master of Science in Materials Science
Level thesis:degree_level
Masters
Discipline thesis:degree_discipline
Physics, Astronomy, and Materials Science
Year
2000

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Cabalu, Jasper S.
Contributors dc:contributor
  • Shyang Hwang

Subjects

dc:subject × 1

Rights

dc:rights
Statement dc:rights
  • © Jasper S Cabalu

Identifiers

dc:identifier.*
Repository record dc:identifier
https://bearworks.missouristate.edu/theses/849
OAI identifier oai:identifier
oai:bearworks.missouristate.edu:theses-1850

Chain of custody

source
Harvested from
Missouri State University
Base URL
bearworks.missouristate.edu/do/oai/
Last updated
2026-07-24
Source record
OAI-PMH GetRecord
citation

Cabalu, Jasper S.. An Investigation of the Surface Properties of Sic For the Growth of Gan Thin Films and Epilayers. Masters thesis, 2000. https://bearworks.missouristate.edu/theses/849