Processing Ion Beam Mixed Nickel/Polyimide Thin Films

We have established a method of fabrication for Nickel/Polyimide ion beam-mixed films using thermal evaporation. We then used the low-temperature characterization system in the Materials Physics Testing lab at SMSU to measure the resistance of each film as a function of temperature. These methods have been described thoroughly as a reference for future research. Measurements made before and after irradiation revealed that ion implantation will reduce the resistance of the film by a small percentage. The ion does used (1 x 10¹⁵ ions/cm²) appears to have simply annealed the metal surface, which in turn reduces the resistance. Experiments have also revealed that the films we made may have a large amount of defects in them and it would merit further investigation into a better fabrication method. Also, the existence of a nickel oxide diffusion barrier at the interface needs to be thoroughly investigated to understand the properties of these films. We believe that our results are drastically affectd by this barrier and by the diffusion of oxygen into the nickel layer.

Name thesis:degree_name

Master of Science in Materials Science

Level thesis:degree_level

Masters

Discipline thesis:degree_discipline

Physics, Astronomy, and Materials Science

Year

1998

Author dc:creator

• Elder, Lisa K.

Contributors dc:contributor

• Ryan Giedd

• Materials Science and Engineering

Statement dc:rights

• © Lisa K Elder

Repository record dc:identifier

https://bearworks.missouristate.edu/theses/846

OAI identifier oai:identifier

oai:bearworks.missouristate.edu:theses-1847