Photoreflectance and Its Application to Semiconductor Characterization
type: CreativeWork
description: A photoreflectance measurement system has been designed and implemented. The system provides a sensitive, accurate, and nondestructive means for the study and characterization of semiconductors. The system includes a microcontroller-based servomechanism to drive a variable neutral density filter for signal normalization. System performance under different conditions has been investigated. The methods to suppress the noise in the measurement are examined. The prototype system has been successfully applied to the characterization of CdTe, semi-insulating GaAs, and GaAs thin films grown on semi-insulating GaAs and Si-doped GaAs in the molecular beam eptaxial system.
abstract: A photoreflectance measurement system has been designed and implemented. The system provides a sensitive, accurate, and nondestructive means for the study and characterization of semiconductors. The system includes a microcontroller-based servomechanism to drive a variable neutral density filter for signal normalization. System performance under different conditions has been investigated. The methods to suppress the noise in the measurement are examined. The prototype system has been successfully applied to the characterization of CdTe, semi-insulating GaAs, and GaAs thin films grown on semi-insulating GaAs and Si-doped GaAs in the molecular beam eptaxial system.
author: Lin, Jianrong
keywords: Materials Science and Engineering
date published: 1998-12-01T08:00:00Z
date modified: 2026-07-24T03:15:54Z
provider: Missouri State University
publisher: Networked Digital Library of Theses and Dissertations
type: WebPage
source organization: Missouri State University