Back to results

Massachusetts Institute of Technology

Design and fabrication of a high precision wafer polishing machine

Abstract

dc:description.abstract

The objective of this project is to design and fabricate a full-scale Chemical- Mechanical Polishing machine, whose performance is much higher than that of the existing technology. The machine consists of a lower structure, an upper structure, and a polishing head. This thesis covers the design of the upper structure in detail. The machine was recently built and tested. The upper machine frame, which is the moving component of this polishing tool, was designed for maximum rigidity using FEA analysis. Vibrational analysis was also performed to design a mechanically quiet system. All of the associated components were designed with extreme precision in mind. In addition to the upper structure, a loading mechanism was also designed for the polishing head. Two high-precision linear drive mechanisms, the z-axis and the x-axis, were designed as the two major axes of motion for this machine tool. The z-axis applies the normal polishing force of 1500 lbs. This axis has a travel of 8", maximum velocity of 4 in/sec, resolution of 50 nm, and a repeatability of 0.0005". The z-axis applies the load using a pneumatic piston, in parallel with a "rotary" ball screw. The x-axis moves the upper machine structure, which weighs over 2000 lbs. The x-axis has a travel of 82", a maximum velocity of 12 in/sec, a maximum acceleration of 0.2g's, a resolution of 10 microns, and a repeatability of 0.002". The x-axis is driven on both sides with two separate motors and ball screws.

Degree

thesis:*
Department dc:contributor.department
Massachusetts Institute of Technology. Dept. of Mechanical Engineering.
Grantor dc:publisher
Massachusetts Institute of Technology
Year dc:date.issued
2000

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Torkaman, Amir (Amir Hesam), 1979-
Advisor dc:contributor.advisor
  • Ernesto Blanco.

Subjects

dc:subject × 1

Rights

dc:rights
Statement dc:rights
  • M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
Language dc:language.iso
eng

Identifiers

dc:identifier.*
Handle dc:identifier.uri
http://hdl.handle.net/1721.1/9015
OAI identifier oai:identifier
oai:dspace.mit.edu:1721.1/9015

Chain of custody

source
Harvested from
MIT
Base URL
dspace.mit.edu/oai/request
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Torkaman, Amir (Amir Hesam), 1979-. Design and fabrication of a high precision wafer polishing machine. Massachusetts Institute of Technology, 2000. http://hdl.handle.net/1721.1/9015