{"id":{"repo_id":"mit","oai_identifier":"oai:dspace.mit.edu:1721.1/76125"},"canonical_url":"https://search.dev.ndltd.org/etd/mit/oai:dspace.mit.edu:1721.1/76125","repository":{"repo_id":"mit","name":"MIT","base_url":"https://dspace.mit.edu/oai/request"},"display":{"title":"A comparison of AB diblock and ABA triblock copolymers of polystyrene and polyferocenylsilane for nanolithography applications","abstract":"Block coopolymers(BCP) have become of interest in the pursuit novel methods of nanolithography. Their ability to self-assembly into periodic geometries with nanoscale feature sizes makes them attractive as etching masks and templating materials for microelectronics and nanodevices. BCP provide a scalable and low-cost method that is compatible with existing semiconductor fabrication technologies. Though various studies have looked at several combinations of block copolymers we focus on the use of solvent annealing as a method to tune the morphology of PS-b-PFS and PS-b- PFS-b-PS block copolymers. These polymers have shown promise as precursors to a variety of materials and in particular this combination of block copolymers is attractive because we have at our dispossible etching methods with a high selectivity between these two polymers.","abstract_html":"Block coopolymers(BCP) have become of interest in the pursuit novel methods of nanolithography. Their ability to self-assembly into periodic geometries with nanoscale feature sizes makes them attractive as etching masks and templating materials for microelectronics and nanodevices. BCP provide a scalable and low-cost method that is compatible with existing semiconductor fabrication technologies. Though various studies have looked at several combinations of block copolymers we focus on the use of solvent annealing as a method to tune the morphology of PS-b-PFS and PS-b- PFS-b-PS block copolymers. These polymers have shown promise as precursors to a variety of materials and in particular this combination of block copolymers is attractive because we have at our dispossible etching methods with a high selectivity between these two polymers.","abstract_has_math":false,"creators":["Ybarra, Juan Carlos"],"institution":"Massachusetts Institute of Technology","degree_name":null,"degree_level":null,"degree_discipline":null,"degree_department":"Massachusetts Institute of Technology. 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Though various studies have looked at several combinations of block copolymers we focus on the use of solvent annealing as a method to tune the morphology of PS-b-PFS and PS-b- PFS-b-PS block copolymers. These polymers have shown promise as precursors to a variety of materials and in particular this combination of block copolymers is attractive because we have at our dispossible etching methods with a high selectivity between these two polymers."],"dc:description.degree":["S.B."],"dc:identifier.uri":["http://hdl.handle.net/1721.1/76125"],"dc:language.iso":["eng"],"dc:publisher":["Massachusetts Institute of Technology"],"dc:rights":["M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. 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