Optimization of the holographic process for imaging and lithography

Since their invention in 1948 by Dennis Gabor, holograms have demonstrated to be important components of a variety of optical systems and their implementation in new fields and methods is expected to continue growing. Their ability to encode 3D optical fields on a 2D plane opened the possibility of novel applications for imaging and lithography. In the traditional form, holograms are produced by the interference of a reference and object waves recording the phase and amplitude of the complex field. The holographic process has been extended to include different recording materials and methods. The increasing demand for holographic-based systems is followed by a need for efficient optimization tools designed for maximizing the performance of the optical system. In this thesis, a variety of multi-domain optimization tools designed to improve the performance of holographic optical systems are proposed. These tools are designed to be robust, computationally efficient and sufficiently general to be applied when designing various holographic systems. All the major forms of holographic elements are studied: computer generated holograms, thin and thick conventional holograms, numerically simulated holograms and digital holograms. Novel holographic optical systems for imaging and lithography are proposed. In the case of lithography, a high-resolution system based on Fresnel domain computer generated holograms (CGHs) is presented. The holograms are numerically designed using a reduced complexity hybrid optimization algorithm (HOA) based on genetic algorithms (GAs) and the modified error reduction (MER) method. The algorithm is efficiently implemented on a graphic processing unit. Simulations as well as experimental results for CGHs fabricated using electron-beam lithography are presented. A method for extending the system's depth of focus is proposed. The HOA is extended for the design and optimization of multispectral CGHs applied for high efficiency solar concentration and spectral splitting. A second lithographic system based on optically recorded total internal reflection (TIR) holograms is studied. A comparative analysis between scalar and (cont.) vector diffraction theories for the modeling and simulation of the system is performed.

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Mechanical Engineering.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2010

Author dc:creator

• Domínguez-Caballero, José Antonio

Advisor dc:contributor.advisor

• George Barbastathis.

• Mechanical Engineering.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/57696

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/57696