Massachusetts Institute of Technology
Tuning and parameter optimization of a digital integral controller for uniform droplet spray applications using lead-free tin-copper solder
Abstract
dc:description.abstractThe advent of legislation restricting the use of lead in electronics requires innovation and refinement in processes for creating lead-free solder spheres for wafer bumping and other surface mount technology. Operation improvements were made upon a uniform droplet spray apparatus, and its digital integral controller was tuned for application to lead-free solder. Parameters determined included a range of initial controller command frequencies that would produce a stable image given a desired droplet diameter, and the value of the controller gain. The frequency range was determined by measuring the diameters of droplets attained at certain frequencies. The controller gain was optimized by measuring the time it took for the controller to reach its steady state at different gain values. It was determined that initial command frequency should be within ±150 Hz of that corresponding to the target diameter and an integral gain of 0.1 dB is the optimal gain for the tin-copper lead-free solder alloy, performing at par with the system specifications when in use with lead-bearing solder.
Degree
thesis:*- Department dc:contributor.department
- Massachusetts Institute of Technology. Dept. of Mechanical Engineering.
- Grantor dc:publisher
- Massachusetts Institute of Technology
- Year dc:date.issued
- 2009
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- De Castro, Eloisa M
- Advisor dc:contributor.advisor
-
- Jung-Hoon Chun.
Subjects
dc:subject × 1Rights
dc:rights- Statement dc:rights
-
- M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
- Licence dc:rights.uri
- Language dc:language.iso
- eng
Identifiers
dc:identifier.*- Handle dc:identifier.uri
- http://hdl.handle.net/1721.1/54543
- OAI identifier oai:identifier
- oai:dspace.mit.edu:1721.1/54543