Technological assessment of light-trapping technology for thin-film Si solar cell

The proposed light trapping technology of Distributed Bragg Reflector (DBR) with Diffraction Grating (DG) and Anti-Reflection Coating (ARC) for thin film Si solar cell was analyzed from the technology, market, and implementation perspectives. Two applications were investigated. For monocrystalline thin film Si solar cell, layer transfer technology is too expensive, while sliver Si technology is more applicable, but impossible to add DBR and DG structure on sliver Si that still attached on native wafer. For amorphous thin film Si solar cell, the cost model was created. Even though best-case assumptions were used, the cost/performance ratio of amorphous thin film Si equipped with proposed light trapping technology was still higher (worse) than incumbent amorphous thin film Si solar cell.

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Materials Science and Engineering.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2009

Author dc:creator

• Susantyoko, Rahmat Agung

Advisor dc:contributor.advisor

• Eugene A. Fitzgerald.

• Materials Science and Engineering.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/54204

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/54204