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Massachusetts Institute of Technology

Phase field model for precipitates in crystals

Abstract

dc:description.abstract

Oxygen precipitate caused by oxygen supersaturation is the most common and important defects in Czochralski (CZ) silicon. The presence of oxygen precipitate in silicon wafer has both harmful and beneficial effects on the microelectronic device production. Oxygen precipitates are useful for gathering metallic contaminants away from the device regions and for increasing the mechanical strength of the wafer [Borghesi, 1995], but they also can destroy the electrical and mechanical characteristics of the semiconductor and microelectronic devices [Abe, 1985; Kolbesen, 1985]. The understanding of the mechanism of the formation and growth of the oxygen precipitates in CZ silicon is a key to improve the quality of silicon wafer. The goal of this thesis is to provide a full understanding of the growth of an isolated oxygen precipitate in CZ silicon and its morphological evolution by means of phase-field method, and to gain the insight of the morphological transition of the oxygen precipitate and the distribution of oxygen, vacancy, and self-interstitial around the single oxygen precipitate. The traditional approach to simulate multiphase system is the sharp interface model. Sharp interface model requires tracking the interface between phases, which make the simulation much difficult and complicate. Phase-field model offers an alternative approach for predicting mesoscale morphological and microstructure evolution of inhomogeneous multiphase system. The most significant computational advantage of a phase-field model is that explicit tracking of the interface is unnecessary. In this thesis, the phase-field model is applied to simulate the evolution of oxygen precipitates in CZ silicon. A phase-field model for a two-component inhomogeneous system was first derived to set up the framework of phase-field method and a dynamically adaptive finite element method also was built to specifically solve phase-field equations. This model was used to investigate the effects of interfacial and elastic properties on the growth of a single precipitate, coarsening of two precipitates, and competitive growth of multiple precipitates. For an isolated precipitate growth, both elastic energy and interfacial energy affect the precipitate morphological evolution.

Degree

thesis:*
Department dc:contributor.department
Massachusetts Institute of Technology. Dept. of Chemical Engineering.
Grantor dc:publisher
Massachusetts Institute of Technology
Year dc:date.issued
2008

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • She, Minggang
Advisor dc:contributor.advisor
  • Robert A. Brown.

Subjects

dc:subject × 1

Rights

dc:rights
Statement dc:rights
  • M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
Language dc:language.iso
eng

Identifiers

dc:identifier.*
Handle dc:identifier.uri
http://hdl.handle.net/1721.1/46020
OAI identifier oai:identifier
oai:dspace.mit.edu:1721.1/46020

Chain of custody

source
Harvested from
MIT
Base URL
dspace.mit.edu/oai/request
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

She, Minggang. Phase field model for precipitates in crystals. Massachusetts Institute of Technology, 2008. http://hdl.handle.net/1721.1/46020