Carbon nanotube assisted formation of sub-50 nm polymeric nano-structures

A novel processing method was developed for sub-50 nm structures by integrating quantum dots (QDs) on patterned polymer substrates. Poly(styrene-alt-maleic anhydride) (PSMa) was prepared by the initiated chemical vapor deposition (iCVD) method, an alternative to spin-on deposition. The sub-50 nm PSMa polymer patterns were prepared by low energy oxygen plasma etching by using CNTs as the masks. The water soluble, amine-functionalized QDs underwent the nucleophilic acyl substitution reaction with the PSMa containing anhydride functional groups. This integration method is use to incorporate high performance QDs on inexpensive, lightweight flexible substrate.

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Materials Science and Engineering.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2008

Author dc:creator

• Lee, Chia-Hua

Advisor dc:contributor.advisor

• Karen K. Gleason.

• Materials Science and Engineering.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/45388

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/45388