Development of a nanomanufacturing line to support dip-pen nanolithography on a massive scale

A manufacturing line to support dip pen nanolithography on a massive scale is justified and described. Appropriate machines are evaluated based on key parameters such as cost, rate, and resolution. Methods for comparing lines are discussed, and solutions for lowest cost and fastest lines are provided.

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Mechanical Engineering.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2008

Author dc:creator

• Luttkus, Jessica (Jessica D.)

Advisor dc:contributor.advisor

• Martin L. Culpepper.

• Mechanical Engineering.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/45381

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/45381