{"id":{"repo_id":"mit","oai_identifier":"oai:dspace.mit.edu:1721.1/43565"},"canonical_url":"https://search.dev.ndltd.org/etd/mit/oai:dspace.mit.edu:1721.1/43565","repository":{"repo_id":"mit","name":"MIT","base_url":"https://dspace.mit.edu/oai/request"},"display":{"title":"Variation reduction in plasma etching via run-to-run process control and endpoint detection","abstract":"Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1997.","abstract_html":"Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1997.","abstract_has_math":false,"creators":["Le, Minh Sy"],"institution":"Massachusetts Institute of Technology","degree_name":null,"degree_level":null,"degree_discipline":null,"degree_department":"Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science","school":null,"contributors":[],"advisors":["Herbert H. Sawin."],"committee_chairs":[],"committee_members":[],"year":1997,"date_issued":"1997","date_published":"1997","updated_at":"2026-07-22T22:21:23Z","subjects":["Electrical Engineering and Computer Science"],"languages":["eng"],"rights":["M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission."],"rights_urls":["http://dspace.mit.edu/handle/1721.1/7582"],"identifier_entries":[]},"links":{"outbound_url":"http://hdl.handle.net/1721.1/43565","outbound_label":"Handle","outbound_source":"dc:identifier.uri"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor.advisor","label":"Advisor","values":["Herbert H. Sawin."]},{"key":"dc:contributor.department","label":"Department","values":["Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science"]},{"key":"dc:creator","label":"Author","values":["Le, Minh Sy"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date.accessioned","label":"Dc Date Accessioned","values":["2008-11-07T20:12:39Z"]},{"key":"dc:date.available","label":"Dc Date Available","values":["2008-11-07T20:12:39Z"]},{"key":"dc:date.issued","label":"Date","values":["1997"]},{"key":"dc:publisher","label":"Institution","values":["Massachusetts Institute of Technology"]},{"key":"dc:type","label":"Dc Type","values":["Thesis"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Electrical Engineering and Computer Science"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language.iso","label":"Language (ISO)","values":["eng"]},{"key":"dc:rights","label":"Dc Rights","values":["M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission."]},{"key":"dc:rights.uri","label":"Rights URI","values":["http://dspace.mit.edu/handle/1721.1/7582"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier.uri","label":"Identifier URI","values":["http://hdl.handle.net/1721.1/43565"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1997.","Includes bibliographical references (leaves 89-91)."]},{"key":"dc:description.degree","label":"Dc Description Degree","values":["M.S."]},{"key":"dc:title","label":"Title","values":["Variation reduction in plasma etching via run-to-run process control and endpoint detection"]}]}],"canonical_facts":{"dc:contributor.advisor":["Herbert H. Sawin."],"dc:contributor.department":["Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science"],"dc:creator":["Le, Minh Sy"],"dc:date.accessioned":["2008-11-07T20:12:39Z"],"dc:date.available":["2008-11-07T20:12:39Z"],"dc:date.issued":["1997"],"dc:description":["Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1997.","Includes bibliographical references (leaves 89-91)."],"dc:description.degree":["M.S."],"dc:identifier.uri":["http://hdl.handle.net/1721.1/43565"],"dc:language.iso":["eng"],"dc:publisher":["Massachusetts Institute of Technology"],"dc:rights":["M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission."],"dc:rights.uri":["http://dspace.mit.edu/handle/1721.1/7582"],"dc:subject":["Electrical Engineering and Computer Science"],"dc:title":["Variation reduction in plasma etching via run-to-run process control and endpoint detection"],"dc:type":["Thesis"]},"updated_at":"2026-07-22T22:21:23Z"}