Design of an STM and EPL control system and linear actuator preload diaphragm

Increasing demand for nano-scale machining processes in the semiconductor industry necessitates new mechanisms for nano-machining. A system capable of nano-scale machining of conductive material via Electronic Pen Lithography (EPL) may fit this niche. The purpose of this research is to develop a system capable of EPL based on a HexFlex six axis nano-manipulator. The system will also be capable of Scanning Tunneling Microscopy (STM), which is will locate the surface with the precision necessary for EPL and also allow the user to confirm the machined features immediately after machining. The import of this work is the development of a low-cost and compact system for nano-machining and nano-scale imaging. The impact of this work may improve the process for manufacturing semiconductors including circuitry, MEMS, and NEMS. The continued development of full six axis machining techniques may allow for the construction of features hitherto impossible to fabricate. This segment of the project focuses on the integration of the HexFlex, a micron stepper motor, precision mounts, a preload diaphragm, and an advanced control system capable of automated EPL and STM verification. Steady electron tunneling is first demonstrated, followed by STM imaging functionality. However, high-speed, high-accuracy EPL machining techniques are reserved for future work.

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Mechanical Engineering.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2007

Author dc:creator

• Roan, Earl Taylor

Advisor dc:contributor.advisor

• Martin L. Culpepper.

• Mechanical Engineering.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/40310

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/40310