General approach for the application of Supramolecular NanoStamping (SuNS) to surfaces of all types

To novel ideas must correspond novel fabrication techniques, that enable the transfer of technologies from laboratories to the market. The success of microelectronics for example can not be separated from the success of the revolutionary manufacturing technology that has fed its expansion. The same is now true for nano- and biotechnologies that, to a large extent, have yet to find the technologies that will best answer their processing needs. The question is to find an approach that will enable the production of devices with the required resolution, complexity and versatility, together with the necessary reliability and potential for high-throughput. Supramolecular NanoStamping (SuNS), a DNA based lithography technique developed in our group, is trying to answer to this set of requirements. In this thesis, I present a new development in this lithography technique, expanding its application to a broad new range of substrates in a substrate-independent fashion. This work, which I conducted during the course of my master, proves the ability of SuNS to adapt to very diverse environments and applications.

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Materials Science and Engineering.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2007

Author dc:creator

• Thévenet, Sarah

Advisor dc:contributor.advisor

• Francesco Stellacci.

• Materials Science and Engineering.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/39925

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/39925