Lean manufacturing in a semiconductor environment : use of variation analysis to focus continuous improvement efforts

Intel's FAB 17 (F17), in an effort to remain competitive and reduce production cycle time, recently committed to adopt lean manufacturing as their approach to continuous improvement. To aid in this effort, the factory staff has dedicated a group people to develop tools based on lean manufacturing principles. Over the last 18 months, they have created three systematic approaches to address various forms of throughput variation, Autonomous Manufacturing (AM), Planned Maintenance (PM), and Waste Elimination (WE). Autonomous Manufacturing focuses on refurbishing manufacturing tools to new or better condition, up-skilling manufacturing technicians, and differentiating abnormal from normal operating conditions. It is meant to address throughput variation as a direct result of old, poorly maintained tools. Planned Maintenance focuses on keeping refurbished tools in new or better conditions, level loading maintenance activities, and minimizing manufacturing tool downtime due to scheduled maintenance activities. It is meant to address throughput variation as a direct result of tool availability variation. Finally, Waste Elimination focuses on optimizing the flow of information, people, and material.

Department dc:contributor.department

Leaders for Manufacturing Program at MIT

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2006

Author dc:creator

• Holly, Sean Michael

Advisor dc:contributor.advisor

• Stephen C. Graves and Stanley Gershwin.

• Sloan School of Management.
• Mechanical Engineering.
• Leaders for Manufacturing Program.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/37132

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/37132