Numerical modeling of interface dynamics and transport phenomena in transport-limited electrolysis processes

Electrochemical reactions in materials and processes induce morphological instability on the cathode, which can lead to porous deposits or system failure. The growth of the protrusion is a complex phenomenon which involves chemical, electrical, and momentum driving forces in the system. Thus, it is important to understand the effect of electrochemistry in phase boundary evolution in order to optimize the performance of such processes. This thesis contributes to predicting and controlling such interface instability phenomena by developing a computational model that captures them. Successful application of the model to emerging metal extraction processes demonstrates its usefulness. A phase field model of electrochemical interface is developed for transport-limited electrolysis with rapid charge redistribution. This new Cahn-Hillard phase field formulation includes a model electrostatic free energy term, which captures the behavior of the diffuse interface under the applied electric field, in addition to transport by free energy gradient and convection. The model agrees with published stability criterion for a solid cathode. When the electrodes and electrolyte are low-viscosity fluids, flow stabilizes the interface.

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Materials Science and Engineering.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2006

Author dc:creator

• Pongsaksawad, Wanida

Advisor dc:contributor.advisor

• Adam C. Powell, IV.

• Materials Science and Engineering.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/36209
• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Identifier URI

http://dspace.mit.edu/handle/1721.1/36209

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/36209