Analyzing sampling methodologies in semiconductor manufacturing

This thesis describes work completed during an internship assignment at Intel Corporation's process development and wafer fabrication manufacturing facility in Santa Clara, California. At the highest level, this work relates to the importance of adequately creating and maintaining data within IT solutions in order to receive the full business benefit expected through the use of these systems. More specifically, the project uses, as a case example, the sampling methodology used in the fab for metrology data collection to show that significant issues exist relating to the software Various recommendations were undertaken to improve the application's effectiveness. As part of this effort, plans for an online reporting tool were developed allowing much greater visibility into the system's ongoing performance. Initial data updates and other improvements resulted in a reduction in both product cycle times and required labor hours for metrology operations. application database and business processes concerning data accuracy and completeness. The organizational challenges contributing to this problem will also be discussed. Without a rigorous focus on the accuracy and completeness of data within manufacturing execution systems, the results of continuous improvement activities will be less than expected. Furthermore, sharing information relating to these projects across geographical boundaries and business units is vital to the success of manufacturing organizations.

Department dc:contributor.department

Leaders for Manufacturing Program at MIT

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2004

Author dc:creator

• Anthony, Richard M. (Richard Morgan), 1971-

Advisor dc:contributor.advisor

• Sara L. Beckman and David E. Hardt.

• Sloan School of Management.
• Mechanical Engineering.
• Leaders for Manufacturing Program.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/34749

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/34749