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Massachusetts Institute of Technology

Development of an immersion maskless lithography system

Abstract

dc:description.abstract

As lithography quickly approaches its limits with current technologies, a host of new ideas is being proposed in hopes of pushing lithography to new levels of performance. The work presented in this thesis explores the use of an immersion scheme to improve the performance of a maskless lithographic technique known as Zone-Plate-Array Lithography (ZPAL). This is believed to be the first implementation of an immersion scheme in a maskless lithography system. This thesis provides a complete description of the Immersion Zone-Plate-Array Lithography (iZPAL) system. Since the zone plate component of the system is largely responsible for its lithographic performance, a thorough analysis of zone plate theory, design, and fabrication is also presented. The focusing performance of an immersion zone plate is then characterized through the experimental reconstruction of its point spread function. Finally, lithography results obtained with the iZPAL system are compared to those obtained with the non-immersion ZPAL system, demonstrating the improvement in resolution, exposure latitude, and depth-of-focus achieved with the immersion scheme.

Degree

thesis:*
Department dc:contributor.department
Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.
Grantor dc:publisher
Massachusetts Institute of Technology
Year dc:date.issued
2005

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Chao, David, Ph. D. Massachusetts Institute of Technology
Advisor dc:contributor.advisor
  • Henry I. Smith.

Subjects

dc:subject × 1

Rights

dc:rights
Statement dc:rights
  • M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
Language dc:language.iso
eng

Identifiers

dc:identifier.*
Handle dc:identifier.uri
http://hdl.handle.net/1721.1/34371
OAI identifier oai:identifier
oai:dspace.mit.edu:1721.1/34371

Chain of custody

source
Harvested from
MIT
Base URL
dspace.mit.edu/oai/request
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Chao, David, Ph. D. Massachusetts Institute of Technology. Development of an immersion maskless lithography system. Massachusetts Institute of Technology, 2005. http://hdl.handle.net/1721.1/34371