Carbon nanotube applications for CMOS back-end processing

Carbon nanotubes are a recently discovered material with excellent mechanical, thermal, and electronic properties. In particular, they are potential ballistic transporters and are theorized to have thermal conductivities greater than any other material currently known. In this thesis, we will examine two possible applications of carbon nanotubes in CMOS back-end processing. The first application is as a replacement for copper interconnects. As interconnect line widths shrink, the electrical resistivity of copper will rise dramatically due to surface scattering effects. Carbon nanotube ballistic transporters may be able to overcome this obstacle, as well as being able to withstand current densities much greater than copper. The second application is an enhanced thermal conductivity dielectric for thermal management purposes. Carbon nanotube-oxide composites demonstrate improved thermal characteristics, and integration into CMOS technology may be able to alleviate some of the heat-removal and distribution problems future integrated circuits will face. We will also examine some of the processing techniques that will be necessary for carbon nanotube commercial deployment. Some of the issues we will discuss are nanotube growth, purification, and separation. In addition, we will consider some of the specific issues that need to be addressed for carbon nanotube integration into CMOS back-end technology, such as in situ growth and self-assembly.

Department dc:contributor.department

Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2005

Author dc:creator

• Wu, Tan Mau, 1979-

Advisor dc:contributor.advisor

• L. Rafael Reif.

• Electrical Engineering and Computer Science.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/30179

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/30179