The development of a prototype Zone-Plate-Array Lithography (ZPAL) system

The research presented in this paper aims to build a Zone-Plate-Array Lithography (ZPAL) prototype tool that will demonstrate the high-resolution, parallel patterning capabilities of the architecture. The experiment will require the integration of micromechanical spatial light modulators with an existing zone-plate-array testbed lithography tool. The system development requires an efficient data-delivery system to promote throughput and a thoughtful optical channel to optimize the lithographic performance of zone-plates. Lithography results obtained from the prototype will be presented along with basic performance characteristics.

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2004

Author dc:creator

• Patel, Amil Ashok, 1979-

Advisor dc:contributor.advisor

• Henry I. Smith.

• Electrical Engineering and Computer Science.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/18054

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/18054